EWMA Process Control for Cyclic Fluctuations in Electronics Manufacturing

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Solution Overview

Problem

Existing manufacturing systems struggle to effectively manage data values with trending cyclic fluctuations in process parameters, leading to the production of electronic devices with abnormal specifications.

Innovation Solution

A manufacturing system that includes a calculation unit to determine upper and lower control limit values based on previous data strings and an exponentially weighted moving average (EWMA) slope value, comparing these with real-time data to generate a comparison result.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If fixed control limit values are used to monitor process parameters, then the manufacturing system can detect abnormal specifications, but the system cannot effectively control data values with trending cyclic fluctuations

Engineering Contradiction:
Improvedetection of abnormal specificationsVSAvoidcontrol of cyclic fluctuating data
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent applies dynamics by transitioning from static fixed control limits to dynamic adaptive control limits. The control limits are continuously updated based on historical data and EWMA calculations, allowing the system to adapt to cyclic fluctuations in process parameters while maintaining reliable detection of abnormal specifications.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent changes the parameter of control limits from fixed values to dynamically adjusted values based on EWMA statistics. By modifying how control limits are calculated and updated over time, the system becomes capable of handling cyclic fluctuations while preserving its ability to detect abnormalities.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the manufacturing system monitors process parameters in real-time, then it can generate warning messages for abnormal specifications, but it produces electronic devices with abnormal specifications when parameters show trending cyclic fluctuations

Engineering Contradiction:
Improvereal-time monitoring capabilityVSAvoidspecification compliance
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent implements feedback by using historical process data to continuously update control limits through EWMA calculations. This feedback mechanism allows the system to learn from past performance and adjust control parameters accordingly, improving specification compliance while maintaining real-time monitoring productivity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent applies preliminary action by establishing adaptive control limits based on historical data before actual production occurs. This preparatory configuration enables the system to anticipate and prevent cyclic fluctuation issues before they result in defective products, while maintaining efficient real-time monitoring.

Inventive Principle:
Principle #10Preliminary action

3Ease of operation

If conventional control methods are applied to process parameters, then the system operates efficiently, but the control limit values become inapplicable when data values show trending cyclic fluctuations

Engineering Contradiction:
Improvesystem operation efficiencyVSAvoidapplicability of control limits
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The patent achieves universality by creating a control system that handles both stable and cyclic fluctuating processes through a unified EWMA-based approach. This multi-functional control mechanism maintains ease of operation while ensuring reliability across different process conditions, eliminating the need for separate control strategies.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250251719A1Manufacturing system for electronic device
Publication Date: 2025.08.07 INNOLUX CORP
  • US20250251719A1 patent drawing
  • US20250251719A1 patent drawing
  • US20250251719A1 patent drawing

AI summary

A manufacturing system for an electronic device is provided. The manufacturing system includes a manufacturing equipment, a calculation unit, and a comparison unit. The manufacturing equipment provides a previous data string and a real-time data string. The calculation unit receives the previous data string and outputs an upper control limit value and a lower control limit value accordingly. The comparison unit generates an exponentially weighted moving average (EWMA) slope value based on the real-time data string, and compares the EWMA slope value with the upper control limit value and the lower control limit value to generate a comparison result.