Excimer Laser Gas Control via Passivation Mode
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In excimer laser apparatuses, the rapid generation of impurities after chamber replacement leads to increased gas pressure, potentially exceeding the upper limit before the preset number of pulses or elapsed time is reached, causing output errors and necessitating frequent total gas replacements, which is time-consuming and inefficient.
Innovation Solution
Implementing a controller that manages gas replacement frequency and pressure control, including a passivating mode immediately after chamber replacement to suppress impurity generation, and switching to a normal mode once the components are passivated, thereby preventing gas pressure from reaching the upper limit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If total gas replacement is performed frequently to suppress impurity generation and gas pressure increase, then gas pressure stability is improved, but operation time is reduced due to frequent interruptions
Solution Approach 1:
The patent applies preliminary action by performing a passivating treatment on the chamber components immediately after chamber replacement, before normal operation begins. This preliminary passivation layer formation suppresses subsequent impurity generation, allowing longer operation intervals between total gas replacements and maintaining gas pressure stability without frequent interruptions.
2Productivity
If the number of pulses or elapsed time before gas replacement is increased to improve productivity, then operation efficiency is improved, but gas pressure may exceed the upper limit causing output errors
Solution Approach 1:
The passivating mode performs preliminary surface treatment on chamber components right after chamber replacement, creating a passivation layer that reduces impurity generation rates. This allows the system to operate for longer periods (higher productivity) while maintaining gas pressure within acceptable limits and avoiding output errors.
Solution Approach 2:
The patent changes the operational parameters by introducing a distinct passivating mode with different gas replacement frequency and pressure control settings immediately after chamber replacement. This parameter change enables extended operation intervals while maintaining output stability, effectively resolving the contradiction between productivity and reliability.
3Ease of operation
If chamber components are left without passivation to simplify operation, then ease of operation is improved, but impurity generation increases leading to frequent gas replacements
Solution Approach 1:
The passivating mode enables the chamber components to self-passivate through controlled interaction with the laser gas, forming protective layers automatically. This self-service mechanism reduces impurity generation without requiring complex external intervention, maintaining both ease of operation and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively prevents gas pressure from exceeding the upper limit, ensuring stable laser output by frequently replacing gas in the passivating mode and reducing the frequency of total gas replacements once the components are passivated, thus maintaining efficient operation.
Implementation Method 1
a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber
Implementation Method 2
a chamber accommodating a pair of discharge electrodes
Data Source
AI summary
A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.