Exhaust Airflow Guide for Substrate Treating Apparatus
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Solution Overview
Problem
The existing substrate treating apparatuses face issues with airflow stagnation and vortex generation when treating rotating substrates, leading to non-uniform film thickness and contamination due to inefficient airflow exhaustion and re-adsorption of contaminants.
Innovation Solution
The apparatus incorporates a guide member with a coupling portion and an extension portion angled at 45 degrees relative to the substrate's tangential direction, guiding airflow obliquely to prevent stagnation and ensure uniform liquid film distribution and exhaust airflow effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate rotates at high speed to improve treating efficiency, then productivity increases, but vortex generation and airflow stagnation worsen
Solution Approach 1:
The harmful vortex flow is extracted and redirected away from the substrate edge region by the exhaust airflow guide. The guide structure captures the centrifugal airflow before it forms a vortex and redirects it toward the exhaust port, eliminating the harmful effect while maintaining high rotation speeds for productivity
Solution Approach 2:
The exhaust airflow guide acts as an intermediary structure between the substrate rotation system and the exhaust port. It mediates the airflow path, transforming the centrifugal flow into a controlled stream that exits smoothly without forming vortices, thus resolving the contradiction between high-speed rotation and vortex prevention
2Productivity
If the substrate rotates at high speed to improve treating efficiency, then productivity increases, but film thickness uniformity deteriorates
Solution Approach 1:
The problematic airflow that causes non-uniform film thickness is extracted and redirected by the exhaust airflow guide. By removing the airflow stagnation and vortex formation at the substrate edge, the liquid distribution becomes uniform across the entire substrate surface, enabling high-speed rotation without sacrificing film quality
Solution Approach 2:
The exhaust airflow guide changes the flow parameters (direction and velocity distribution) of the air stream within the treating chamber. By optimizing the airflow pattern, the liquid film forms uniformly on the rotating substrate even at high rotation speeds, thus improving manufacturing precision while maintaining productivity
3Productivity
If the exhaust port is positioned to directly exhaust airflow, then exhaust efficiency improves, but contaminant re-adsorption worsens
Solution Approach 1:
The exhaust airflow guide extends the exhaust path into a third dimension by directing airflow obliquely downward toward the exhaust port. This dimensional change in airflow direction allows efficient exhaust removal while preventing contaminants from settling back onto the substrate, as the air stream carries them away along a downward trajectory
Solution Approach 2:
The exhaust airflow guide serves as an intermediary structure that controls the interaction between the exhaust airflow and the substrate. It ensures that the exhaust stream efficiently removes contaminants while the guide geometry prevents direct contact between the airflow and substrate surface, eliminating re-adsorption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures uniform liquid film thickness across the substrate and prevents contaminant re-adsorption by enhancing airflow exhaustion and guiding it away from the substrate, improving treating efficiency and reducing contamination.
Implementation Method 1
an airflow 84 flows along a rotation direction of the substrate W from a center to an edge of the substrate W at a surface of the substrate W due to a centrifugal force
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.