Exhaust Amplifier Layout for Shared Substrate Processing Lines
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Solution Overview
Problem
Existing substrate processing methods face challenges in efficiently exhausting fumes and by-products due to insufficient suction power from multiple cleaning machines sharing a single exhaust facility, leading to incomplete removal of exhaust gases and debris, which requires additional space and frequent replacement of chemically resistant fans and power sources.
Innovation Solution
The implementation of an exhaust amplifier within the substrate processing apparatus that uses acceleration gas to enhance the exhaust flow rate through the exhaust pipe, increasing the exhaust volume without the need for additional facilities or power-dependent components like fans, by employing a buffer space and curved surfaces to amplify the exhaust flow speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If multiple cleaning machines share a single exhaust facility, then the exhaust facility structure is simplified, but the suction power becomes insufficient to handle the full exhaust volume
Solution Approach 1:
The exhaust facility is segmented into multiple independent exhaust pipes, each serving a specific cleaning machine. This allows each pipe to be optimized for its specific exhaust load while maintaining overall system simplicity.
Solution Approach 2:
An exhaust amplifier is introduced as an intermediary component in the exhaust pipe to enhance exhaust flow rate. This device uses acceleration gas to amplify the exhaust flow without requiring additional fans or power sources, thereby increasing productivity while maintaining structural simplicity.
2Productivity
If a fan and power source are installed in the exhaust pipe to increase exhaust volume, then the exhaust volume increases, but additional space is required and maintenance becomes difficult
Solution Approach 1:
The complex fan and power source components are extracted from the exhaust pipe system. Instead, a simpler exhaust amplifier device is used that achieves the same exhaust volume increase without requiring additional space or complex maintenance.
Solution Approach 2:
The mechanical fan system is replaced with a gas-dynamic exhaust amplifier system. The exhaust amplifier uses acceleration gas to amplify exhaust flow through gas dynamics rather than mechanical rotation, eliminating the need for fans and power sources.
3Reliability
If fans with strong chemical resistance are used in the exhaust pipe, then the fan can handle chemical exposure, but the fan still has limited lifespan and requires frequent replacement
Solution Approach 1:
The mechanical fan system susceptible to chemical degradation is replaced with a exhaust amplifier system that has no moving parts. The exhaust amplifier uses gas dynamics to achieve the same exhaust function without chemical-resistant materials, thereby eliminating lifespan limitations.
Solution Approach 2:
Instead of using expensive, chemically resistant fan materials with limited lifespans, the invention uses a simple, maintenance-free exhaust amplifier structure that does not require chemical resistance, effectively making the system disposable-free and maintenance-free.
4Volume of stationary object
If the exhaust facility is not expanded, then the existing infrastructure is maintained, but the suction power is insufficient to remove all exhaust gases and debris
Solution Approach 1:
The exhaust flow rate parameter is changed by introducing acceleration gas into the exhaust pipe. This parameter change amplifies the exhaust flow without requiring an increase in the physical size of the exhaust facility, thereby improving removal efficiency within the existing infrastructure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively increases the exhaust volume of fumes and by-products without requiring additional space or frequent replacements, ensuring efficient removal and potentially reducing drying time for substrates, while avoiding the need for separate fans and power sources.
Implementation Method 1
an exhaust amplifier installed in the exhaust pipe and for supplying acceleration gas to a passage of the exhaust pipe to amplify an exhaust flow rate of exhaust gas flowing in the exhaust pipe
Data Source
AI summary
Provided is a substrate processing apparatus and a substrate processing method that are capable of increasing exhaust volume without increasing exhaust facilities. An apparatus for processing a substrate includes: a processing chamber having a processing space for processing a substrate; a support unit for supporting the substrate in the processing space; a liquid supply unit for supplying a liquid to a substrate supported by the support unit; and an exhaust unit for exhausting the processing space, in which the exhaust unit includes: an exhaust pipe connected to the processing space; and an exhaust amplifier installed in the exhaust pipe and for supplying acceleration gas to a passage of the exhaust pipe to amplify an exhaust flow rate of exhaust gas flowing in the exhaust pipe.


