Semiconductor Exhaust Buffer Preventing Pipe Clogging
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Solution Overview
Problem
Semiconductor processing generates waste gases containing contaminants that can cause pipe clogging and environmental harm, and existing exhaust systems are ineffective in mitigating these issues.
Innovation Solution
An exhaust system comprising a process chamber, a buffer that dualizes and disperses waste gas, a reactor for heat-treating the gas, a wet tank for cleaning water storage, and a controller to manage valve operations, which includes separate outlets for powder sizes and valves to redirect flow based on powder levels, preventing clogging and ensuring effective treatment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If waste gas is directly discharged from the process chamber, then the exhaust system is simple, but pipe clogging and blockage occur due to powder generation
Solution Approach 1:
A buffer chamber is introduced as an intermediary component between the process chamber and the exhaust pipeline. The buffer receives waste gas from the process chamber and allows powder to settle and disperse before the gas enters the main exhaust system, preventing pipe clogging while maintaining system simplicity
Solution Approach 2:
The buffer performs preliminary treatment of waste gas by allowing powder to settle and disperse before the gas enters the main exhaust system. This preliminary action prevents powder accumulation in pipes downstream, ensuring continuous flow without blockages
2Reliability
If a buffer is added to treat waste gas, then pipe clogging is prevented, but the device complexity increases
Solution Approach 1:
The buffer chamber is divided into an upper space and a lower space with separate outlets. The upper outlet handles gas flow while the lower outlet handles powder discharge, allowing independent optimization of each function and simplifying the overall system design
Solution Approach 2:
The buffer chamber serves multiple functions: it acts as a settling chamber for powder, a dispersal chamber for gas, and a flow regulation device. This multi-functionality reduces the need for additional separate components, balancing reliability improvement with device complexity
3Device complexity
If powder is not dispersed in the waste gas, then the exhaust system is simpler, but clogging and blockage of pipes occur
Solution Approach 1:
The buffer chamber acts as a mediator that facilitates powder dispersal in the waste gas. By providing a dedicated space for powder to break up and disperse before entering the main exhaust system, the buffer prevents harmful clogging effects without requiring complex treatment devices downstream
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively prevents pipe clogging by dualizing and dispersing waste gas and powder, ensuring efficient heat treatment and cleaning, thereby reducing environmental impact and maintaining system functionality.
Implementation Method 1
the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas
Implementation Method 2
a reactor configured to burn the waste gas
Implementation Method 3
a wet tower configured to decompose the powder in the waste gas by using the cleaning water
Implementation Method 4
a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water
Data Source
AI summary
An exhaust system including a process chamber in which a semiconductor processing is performed, a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas may be provided, a reactor configured to burn the waste gas, a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water, and a wet tower configured to decompose the powder in the waste gas by using the cleaning water may be provided.