Exhaust Pipe Gas-Liquid Separation for Substrate Processing

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Solution Overview

Problem

Existing substrate liquid processing apparatuses face challenges in effectively separating gas and liquid exhaust gases, leading to potential mist introduction into gas exhaust paths, which can contaminate the system and reduce separation efficiency.

Innovation Solution

The apparatus incorporates a configuration with a first exhaust pipe positioned above the liquid processing unit and a second exhaust pipe that guides exhaust gases upward, utilizing an upright portion to separate gases from mist, with a drain unit at the bottom to collect liquefied mist and contaminants, enhancing gas-liquid separation and preventing system contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a liquid drain cup and gas exhaust cup are provided in the liquid processing unit to perform liquid draining and gas exhaust independently, then gas-liquid separation is improved, but mist may still be introduced into the gas exhaust path

Engineering Contradiction:
Improvegas-liquid separation efficiencyVSAvoidmist introduction into gas exhaust path
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The exhaust system is divided into separate functional components: a gas exhaust cup for gas evacuation, a liquid drain cup for liquid drainage, and a mist trap for mist collection. This segmentation allows each component to handle specific phases independently, improving overall gas-liquid separation efficiency while preventing mist from entering the gas exhaust path.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

A mist trap is introduced as an intermediary component between the liquid processing unit and the gas exhaust path. The mist trap captures mist particles before they can be drawn into the gas exhaust cup, serving as a buffer that prevents harmful mist introduction while maintaining effective gas evacuation.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-affected harmful factors

If a mist trap is provided in the gas exhaust path to suppress mist introduction, then mist entry is reduced, but further suppression of mist is still required

Engineering Contradiction:
Improvemist introduction suppressionVSAvoidgas-liquid separation efficiency
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

The mist trap is positioned to perform preliminary action by capturing mist particles before they enter the gas exhaust path. This preliminary separation ensures that the gas exhaust cup receives predominantly clean gas, enhancing the overall reliability of gas-liquid separation while maintaining effective mist suppression.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves gas-liquid separation efficiency, reduces mist introduction into the gas exhaust path, and effectively collects contaminants, leading to a cleaner exhaust process and reduced system contamination.

Implementation Method 1

the second exhaust pipe is configured to evacuate the liquid processing unit through the first exhaust pipe by an exhaust device, with the other end connected to a portion of the first exhaust pipe located above the liquid processing unit

Methodology Applied
Scientific EffectGravitational settling: Gravitation

Implementation Method 2

utilizing an upright portion to separate gases from mist, with a drain unit at the bottom to collect liquefied mist and contaminants

Methodology Applied
Scientific EffectCondensation: Condensation

Data Source

PatentUS10056269B2Substrate liquid processing apparatus
Publication Date: 2018.08.21 TOKYO ELECTRON LTD
  • US10056269B2 patent drawing
  • US10056269B2 patent drawing
  • US10056269B2 patent drawing

AI summary

Gas-liquid separation of an exhaust gas from a liquid processing unit can be improved. A substrate liquid processing apparatus includes a liquid processing unit, a first exhaust pipe and a second exhaust pipe. The liquid processing unit is configured to process a substrate with a processing liquid. At least a part of the first exhaust pipe at is located above the liquid processing unit. One end of the second exhaust pipe is connected to the liquid processing unit, and the second exhaust pipe is configured to evacuate the liquid processing unit through the first exhaust pipe by an exhaust device. Further, the other end of the second exhaust pipe is connected to a portion of the first exhaust pipe which is located above the liquid processing unit.