Exhaust System Controller for Semiconductor Manufacturing
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Solution Overview
Problem
Conventional exhaust systems in semiconductor manufacturing apparatuses operate inefficiently due to lack of consideration for optimal conditions based on gas type and flow rate, leading to excess energy consumption, improper maintenance timing, and equipment failures.
Innovation Solution
An exhaust system with a controller that adjusts the operation of vacuum pumps, exhaust gas treatment apparatuses, and diluent N2 units based on specific process information, including gas type and flow rate, to optimize energy use and schedule maintenance accordingly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If each apparatus of the exhaust system is operated by ON/OFF control based on signals from the manufacturing apparatus, then the operation is simple and easy to control, but excess energy is consumed because optimal operating conditions are not considered
Solution Approach 1:
The patent implements dynamic control of the vacuum pump and exhaust gas treatment apparatus by continuously adjusting their operating parameters (rotation speed, treatment capacity) according to real-time process conditions such as gas flow rate and chamber pressure, rather than using fixed ON/OFF control. This dynamic adjustment optimizes energy consumption while maintaining effective evacuation and exhaust gas treatment.
Solution Approach 2:
The control device changes operational parameters of the vacuum pump (rotation speed) and exhaust gas treatment apparatus (treatment capacity) based on process conditions including gas flow rate, chamber pressure, and pump temperature. This parameter optimization reduces energy consumption while maintaining system effectiveness.
2Productivity
If the vacuum pump operates with high pumping capacity to ensure adequate evacuation, then evacuation performance is improved, but energy consumption increases due to excess capacity
Solution Approach 1:
The vacuum pump's rotation speed is dynamically adjusted by the control device based on real-time chamber pressure and gas flow rate conditions. The pump operates at higher speeds when evacuation demand is high and reduces speed when demand is low, optimizing the balance between evacuation performance and energy consumption.
Solution Approach 2:
The control device receives feedback signals from pressure sensors and flow rate meters to continuously monitor chamber conditions and adjusts the vacuum pump's rotation speed accordingly. This closed-loop control ensures adequate evacuation performance while avoiding excessive energy consumption by matching pump capacity to actual demand.
3Reliability
If the exhaust gas treatment apparatus operates with high treatment capacity to ensure complete treatment, then treatment effectiveness is improved, but energy consumption and fuel usage increase
Solution Approach 1:
The exhaust gas treatment apparatus's treatment capacity is dynamically adjusted by the control device based on the type and flow rate of exhaust gas. The system operates at higher treatment capacity when harmful gases are present in large amounts and reduces capacity when gas flow is low or gases are less hazardous, optimizing energy and fuel consumption while maintaining treatment effectiveness.
Solution Approach 2:
The control device changes operational parameters of the exhaust gas treatment apparatus including treatment capacity, air supply rate, and fuel supply rate based on detected exhaust gas characteristics. This parameter optimization ensures complete treatment of harmful gases while minimizing energy and fuel consumption.
4Extent of automation
If maintenance is performed based on fixed schedules or accumulated operation time, then maintenance timing is predictable, but maintenance may occur too early or too late leading to inefficiency or equipment failure
Solution Approach 1:
The control device continuously monitors operational parameters including pump temperature, vibration, and pressure differential to detect signs of degradation or abnormal conditions. Based on this real-time feedback, the system predicts when maintenance will be needed and schedules maintenance at the optimal time, preventing both premature maintenance and equipment failure.
Solution Approach 2:
The control device performs preliminary diagnosis and prediction of maintenance needs by analyzing trends in operational parameters before actual degradation occurs. This allows maintenance to be scheduled in advance at the optimal time, preventing equipment failure while avoiding unnecessary early maintenance.
5Reliability
If the diluent N2 unit supplies N2 gas continuously to ensure adequate dilution of exhaust gases, then dilution effectiveness is improved, but N2 gas consumption increases
Solution Approach 1:
The diluent N2 unit's gas supply rate is dynamically adjusted by the control device based on the type and flow rate of exhaust gas from the chamber. The system supplies N2 gas at higher rates when harmful gases are present in large amounts and reduces supply rate when gas flow is low or gases are less hazardous, optimizing N2 gas consumption while maintaining adequate dilution effectiveness.
Solution Approach 2:
The control device changes the N2 gas supply rate parameter based on detected exhaust gas characteristics including gas type and flow rate. This parameter optimization ensures adequate dilution of harmful gases while minimizing N2 gas consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system reduces energy consumption, prevents equipment failures by ensuring optimal operation and timely maintenance, and stabilizes vacuum pump performance by adjusting operational parameters and supply quantities.
Implementation Method 1
catalytic converter designed to reduce emissions of hydrocarbons (HC), carbon monoxide (CO) and nitrogen oxides (NOx)
Implementation Method 2
exhaust gases generated by combustion of fuel in an internal combustion engine
Data Source
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AI summary
An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).