Expandable Cleaning Brush for Uniform Substrate Contact
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Solution Overview
Problem
Existing substrate cleaning apparatuses face limitations due to sagging cleaning brushes, resulting in nonuniform cleaning friction and incomplete removal of foreign substances from substrates during the cleaning process.
Innovation Solution
A substrate cleaning apparatus and method utilizing a cylindrical cleaning brush with expandable pressure chambers along its longitudinal axis, allowing specific portions of the brush to protrude radially for enhanced contact and cleaning, and a foreign substance sensing system to adjust the protrusion based on the distribution of contaminants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a support for rotatably supporting the cleaning brushes is disposed at only one side, then the device complexity is reduced, but the cleaning uniformity deteriorates due to brush sagging
Solution Approach 1:
The patent applies the anti-weight principle by introducing a counterbalancing mechanism that compensates for the sagging of cleaning brushes caused by gravity. The support structure includes counterweights or balancing elements that offset the weight of the brushes, maintaining consistent contact pressure between the brushes and substrate throughout the cleaning process, thereby achieving uniform cleaning without increasing overall device complexity.
Solution Approach 2:
The patent employs parameter changes by making the cleaning brush support structure adjustable. The support allows for modification of brush position, contact pressure, and orientation parameters to compensate for sagging. This adjustability enables the system to maintain optimal cleaning uniformity while keeping the basic support configuration relatively simple.
2Adaptability or versatility
If the cleaning brush surface is formed of a flexible material, then the brush can adapt to substrate variations, but nonuniform cleaning occurs due to inconsistent contact pressurizing force
Solution Approach 1:
The patent applies the dynamics principle by designing a support mechanism that actively adjusts the cleaning brush's contact pressure with the substrate during operation. The system dynamically compensates for brush deformation and sagging through real-time position control and pressure regulation, ensuring uniform cleaning force distribution while maintaining the flexibility needed for substrate adaptation.
Solution Approach 2:
The patent implements feedback control by incorporating sensors that monitor the contact pressure and position of the cleaning brushes. This feedback information is used to adjust the brush support mechanism, maintaining consistent pressure distribution across the substrate surface. The flexible brush material combined with feedback control ensures both adaptability and cleaning uniformity.
3Device complexity
If a gap occurs between the cleaning brush and substrate due to brush movement error, then the device complexity increases to accommodate adjustment mechanisms, but cleaning effectiveness deteriorates
Solution Approach 1:
The patent applies preliminary action by pre-adjusting the cleaning brush support mechanism to account for expected movement variations and sagging. The system is configured in advance with built-in compensation for typical operational deviations, ensuring that the brushes maintain consistent contact with the substrate throughout the cleaning process without requiring complex real-time correction mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures uniform and complete removal of foreign substances from substrates by applying higher frictional forces where needed, improving cleaning efficiency and effectiveness.
Implementation Method 1
the cleaning brush includes a plurality of pressure chambers expanding by a fluid pressure and disposed along a longitudinal direction of a rotation axis rotating at a central portion of the cleaning brush
Implementation Method 2
the outer circumferential surface contacting the substrate to clean the substrate... allowing a portion of the outer circumferential surface to protrude in a radial direction and thus contact-clean a portion of the substrate
Data Source
AI summary
Provided are a substrate cleaning apparatus and method and a brush assembly used therein. The substrate cleaning apparatus for contact-cleaning a substrate includes a cleaning brush rotatably disposed in a cylindrical shape and having an outer circumferential surface contacting the substrate to clean the substrate. Here, the cleaning brush includes a plurality of pressure chambers expanding by a fluid pressure and disposed along a longitudinal direction of a rotation axis rotating at a central portion of the cleaning brush, and the plurality of pressure chambers are individually expandable to allow a portion of the outer circumferential surface to protrude in a radial direction and thus contact-clean a portion of the substrate.