Exposed Conductor Electron Beam Detector With Plasma Shield

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Solution Overview

Problem

Existing electron beam sensors, particularly those with vacuum chambers, face challenges in accurately measuring electron beam intensity due to their large size and need to be positioned outside the direct electron beam path, leading to shadowing issues that affect sterilization processes, especially in packaging materials.

Innovation Solution

A detector system comprising an exposed conductor with a plasma shield, where a second conductor is isolated and connected to a voltage potential to form a window that allows direct exposure to the electron beam, minimizing the impact of plasma electrons and enabling accurate intensity measurement within the electron beam path.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a vacuum chamber is used to isolate the conductor from the surrounding environment, then the conductor is protected from environmental interference, but the sensor becomes large and must be positioned outside the direct electron beam path, causing shadowing of target objects

Engineering Contradiction:

Improveisolation from environmental interferenceVSAvoidsensor size

Core Design Contradiction:

ReliabilityVSArea of stationary object

Solution Approach 1:

The patent extracts the vacuum chamber from the sensor design, eliminating the need for a sealed vacuum environment. The conductor is exposed directly to the environment while maintaining accurate electron beam measurement through the use of a plasma shield that selectively blocks plasma electrons while allowing measurement electrons to reach the conductor.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The plasma shield acts as an intermediary element between the electron beam and the conductor. It selectively filters plasma electrons generated by the electron beam while allowing measurement electrons to reach the conductor, thus protecting the conductor from plasma interference without requiring a vacuum chamber.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Productivity

If the sensor is positioned outside the direct electron beam path to avoid shadowing, then target objects can be properly irradiated, but the sensor can only measure secondary irradiation information from the periphery

Engineering Contradiction:

Improvesterilization effectivenessVSAvoidelectron beam intensity measurement

Core Design Contradiction:

ProductivityVSMeasurement precision

Solution Approach 1:

The patent removes the vacuum chamber constraint that forced sensors to be positioned outside the beam path. By eliminating this constraint and using a plasma shield to protect the conductor, the sensor can be positioned directly in the electron beam path, enabling direct measurement of electron beam intensity rather than relying on secondary irradiation from periphery positions.

Inventive Principle:

Principle #2Taking out (Extraction)

3Reliability

If an insulating layer is provided on the conductor to avoid influence from electrostatic fields and plasma electrons, then the electrode output is protected from plasma interference, but the conductor cannot directly sense electron beam density

Engineering Contradiction:

Improveprotection from plasma interferenceVSAvoidelectron beam density sensing

Core Design Contradiction:

ReliabilityVSMeasurement precision

Solution Approach 1:

The plasma shield serves as an intermediary that selectively blocks plasma electrons while allowing measurement electrons to reach the conductor. This differs from an insulating layer that would block all electron interaction. The plasma shield maintains plasma protection while enabling direct electron beam density sensing through its selective filtering mechanism.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration allows for precise measurement of electron beam intensity, reducing shadowing effects and ensuring consistent sterilization of packaging materials by accurately sensing the electron beam's intensity and regulating it as needed.

Implementation Method 1

a second conductor isolated from the exposed conductor and positioned to impact an influence of secondary electrons on the exposed conductor by substantially limiting exposure of said conductor to at least the direction of the electron beam path

Methodology Applied

Scientific EffectPlasma shielding: Plasma

Implementation Method 2

Electrons from the electron beam which have sufficient energy will penetrate a window, such as a titanium (Ti) window of the vacuum chamber and be absorbed by the conductor. The absorbed electrons establish a current in the conductor. The magnitude of this current is a measure of the number of electrons penetrating the window of the vacuum chamber.

Methodology Applied

Scientific EffectElectron absorption and current establishment: Conduction (electrical)

Data Source

PatentUS7375345B2Exposed conductor system and method for sensing an electron beam

Publication Date: 2008.05.20 TETRA LAVAL HOLDINGS & FINANCE SA

AI summary

A detector is disclosed for sensing an intensity of an electron beam generated along a path. An exemplary detector includes an exposed conductor attached to a support which is configured to locate the exposed conductor within a path of an electron beam; a grounded conductor isolated from the exposed conductor, the grounded conductor partly surrounding the exposed conductor to form a plasma shield having a window positioned at least in a direction of the electron beam path.