Exposure Apparition Acceleration Error Correction
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Solution Overview
Problem
Conventional exposure apparatuses face measurement errors due to stage acceleration and deceleration, which affect the precision of substrate positioning and exposure in semiconductor manufacturing, as they fail to accurately measure the substrate level during stage acceleration and constant velocity movements.
Innovation Solution
An exposure apparatus that uses a measurement device to calculate a correction value for measurement errors caused by stage acceleration, by measuring the substrate level at multiple points, including one point during acceleration and another during constant velocity, and adjusts the positioning mechanism to correct for these errors, ensuring precise substrate positioning and exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the stage accelerates or decelerates to quickly position the substrate, then productivity is improved, but measurement error increases due to deformation of the main structure and stage
Solution Approach 1:
The system performs preliminary measurements at multiple positions before exposure, including positions before and after the exposure region. These preliminary measurements are used to calculate correction values that compensate for acceleration-induced deformations during the actual exposure process, enabling accurate measurement despite stage acceleration.
Solution Approach 2:
The system changes the measurement parameters by performing measurements at multiple different positions (before exposure region, during exposure region, after exposure region) and using statistical processing to calculate correction values. This allows the system to adapt to varying acceleration conditions and maintain measurement accuracy.
2Measurement precision
If the stage moves at constant velocity for stable measurement, then measurement precision is improved, but productivity decreases due to slower positioning
Solution Approach 1:
The system performs preliminary measurements at multiple positions before the actual exposure. These measurements are taken during stable constant velocity movement, allowing accurate baseline data to be collected. The correction values derived from these preliminary measurements are then applied during high-speed acceleration phases.
Solution Approach 2:
The system uses feedback from multiple measurement points to continuously calculate and apply correction values. By comparing measurements taken at different positions and velocities, the system adjusts the correction values to maintain measurement accuracy across varying stage velocities.
3Measurement precision
If multiple measurement points are used to calculate correction values, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The measurement system is segmented into multiple independent measurement points positioned at different locations (before exposure region, during exposure region, after exposure region). Each measurement point provides independent data that contributes to the overall correction value calculation, allowing the system to capture spatial variations in deformation.
Solution Approach 2:
The same measurement device and methodology are used across multiple measurement points, making the system multi-functional. The correction value calculation process serves multiple purposes: compensating for acceleration effects, adapting to different velocity conditions, and maintaining accuracy across the entire substrate surface.
Data Source
AI summary
A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.