Exposure Apparatus Controller Synchronization for Semiconductor Line Width
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Solution Overview
Problem
Variations in line width of manufactured semiconductors occur due to changes in timing between exposure and post-exposure baking or development processes in existing exposure and developing systems.
Innovation Solution
An exposure apparatus with a first controller for exposing substrates and a second controller that generates and transmits control signals to a developing device to synchronize post-exposure baking or development processes based on predetermined waiting times, ensuring consistent timing from exposure to post-exposure baking or development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the exposure apparatus and developing device operate independently to maximize processing speed, then productivity is improved, but the timing variation between exposure and PEB/development causes line width variation
Solution Approach 1:
The exposure apparatus transmits exposure timing information to the developing device, creating a feedback mechanism that allows the developing device to adjust its operation based on actual exposure timing. This ensures synchronized operation between exposure and PEB/development processes, maintaining constant timing intervals while preserving high processing speeds of both independently operating devices
Solution Approach 2:
The patent merges the timing control functions of the exposure apparatus and developing device by establishing a communication link where exposure timing information from the exposure apparatus is used to coordinate PEB and development operations in the developing device. This integration synchronizes the previously independent operations, eliminating timing variations without sacrificing the productivity benefits of independent device operation
2Manufacturing precision
If the timing between exposure and PEB/development is adjusted to optimize line width, then manufacturing precision is improved, but the flexibility in responding to apparatus operation state changes is reduced
Solution Approach 1:
The system dynamically adjusts the timing coordination between exposure and PEB/development based on real-time apparatus operation states. The developing device receives exposure timing information and adapts its PEB and development operations accordingly, allowing the system to maintain optimal timing intervals while flexibly responding to variations in processing speeds, substrate conveyance times, and other operational parameters
Data Source
AI summary
An exposure apparatus for exposing a substrate coated with a photosensitive material to radiant energy comprises a first controller and a second controller. The first controller is configured to control a process of exposing the substrate. The second controller is configured to generate a control signal corresponding to a time at which the substrate is exposed under a control by the first controller, and to transmit the control signal to a developing apparatus.