Exposure Apparatus Maintenance Synchronization for Downtime Reduction
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Solution Overview
Problem
In lithography processes for semiconductor and liquid crystal display device manufacturing, achieving an operating rate of 95% or more is challenging due to the need for frequent maintenance and self-calibration of exposure apparatuses, especially when inline connected with coater/developer systems, which increases downtime and reduces performance.
Innovation Solution
An exposure apparatus with an operation decision unit that synchronizes maintenance operations with the substrate processing apparatus, allowing parallel performance of necessary maintenance tasks during downtime, reducing overall downtime and maintaining performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If periodic maintenance and self-calibration are performed frequently to maintain high accuracy state, then exposure accuracy is improved, but downtime increases and operating rate decreases
Solution Approach 1:
The system performs maintenance and self-calibration operations in advance during periods when the substrate processing apparatus is already stopped, so that when the exposure apparatus needs to resume operation, it is already calibrated and maintained, eliminating the need for additional downtime
Solution Approach 2:
The invention combines maintenance of the exposure apparatus with maintenance of the substrate processing apparatus by coordinating their schedules, so that both apparatuses undergo maintenance simultaneously during the same downtime period, maximizing resource utilization and minimizing total downtime
2Productivity
If the exposure apparatus is inline connected with substrate processing apparatus, then throughput is improved, but the operating rate becomes more difficult to achieve 95% due to additional maintenance requirements
Solution Approach 1:
The system merges the maintenance schedules of the exposure apparatus and substrate processing apparatus, coordinating them to undergo maintenance simultaneously. This reduces the cumulative downtime impact on the inline system's operating rate while preserving the throughput benefits of the inline configuration
Solution Approach 2:
The system proactively schedules and performs maintenance operations during anticipated downtime periods of the substrate processing apparatus, ensuring the exposure apparatus is ready for immediate resumption of operation, thus minimizing disruptions to the inline system's throughput
3Manufacturing precision
If self-calibration function is enhanced to meet higher accuracy demands, then exposure accuracy stabilization is improved, but downtime during calibration increases
Solution Approach 1:
The system performs self-calibration operations in advance during periods when the substrate processing apparatus is stopped, so that calibration is completed before the exposure apparatus needs to resume operation, eliminating calibration downtime from the operational schedule
Solution Approach 2:
The system maintains continuous operational readiness by performing calibration during non-operational periods of the substrate processing apparatus, ensuring the exposure apparatus can immediately resume useful action without interruption when needed
Data Source
AI summary
An exposure apparatus is equipped with a main controller that decides an operation of the exposure apparatus based on information on maintenance from a C/D. Therefore, the main controller can decide to perform a specific operation, which is necessary for maintaining performance of the exposure apparatus and requires stop of the primary operation of the exposure apparatus, during maintenance of the C/D, that is, when the primary operation of the exposure apparatus has to be stopped by necessity, in parallel with the maintenance of the C/D. As a consequence, downtime of the exposure apparatus necessary for performing the specific operation can be decreased as a whole, which makes it possible to improve the operating rate without lowering apparatus performance of the exposure apparatus that is inline connected to a substrate processing apparatus.