Exposure Apparatus Polarized Light Mask Overlap
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Solution Overview
Problem
Existing exposure apparatuses become overly complex when forming complicated patterns, as the number of patterns increases, leading to a corresponding increase in apparatus configuration.
Innovation Solution
An exposure apparatus with a transporting section for a substrate with an orientation film, featuring first and second polarized light output sections and masks with aperture sections that intersect at an angle less than 90 degrees, allowing for overlapping exposure of specific regions on the orientation film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the number of patterns increases to form complicated patterns, then the pattern complexity increases, but the apparatus configuration becomes complicated
Solution Approach 1:
The patent combines multiple aperture sections (first aperture section and second aperture section) into a single mask, where these aperture sections overlap to form multiple patterns. This merging approach allows the apparatus to form complicated patterns without requiring separate masks for each pattern, thereby reducing apparatus complexity while maintaining the ability to create complex patterns through the overlapping arrangement of aperture sections.
2Manufacturing precision
If multiple polarized light output sections and masks are used to form multiple orientation regions, then the orientation control precision improves, but the apparatus complexity increases
Solution Approach 1:
The mask is segmented into multiple aperture sections (first aperture section and second aperture section), each associated with different polarized light paths. These segmented aperture sections can be independently designed and positioned to create different orientation regions on the substrate, allowing precise orientation control without requiring completely separate mask systems for each region.
Solution Approach 2:
The patent introduces the dimension of overlapping aperture sections in the mask plane, where the first aperture section and second aperture section overlap to create regions with different orientation characteristics. This dimensional approach allows multiple orientation regions to be formed within a single mask structure, achieving precise orientation control without increasing the number of masks in the z-direction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration simplifies the apparatus by reducing the number of required polarized light output sections and masks, enabling the formation of multiple orientation regions with different orientation directions using a single exposure apparatus, while maintaining precise control over the orientation direction of the orientation film.
Implementation Method 1
a first polarized light output section that faces toward the orientation film of the substrate and outputs first polarized light having a first polarization direction
Implementation Method 2
a second polarized light output section that is arranged downstream from the first polarized light output section in the transport direction, faces toward the orientation film of the substrate, and outputs second polarized light having a second polarization direction that intersects the first polarization direction at an angle of less than 90 degrees
Data Source
AI summary
Provided is an exposure apparatus including a transporting section; a first polarized light output section that outputs first polarized light; a second polarized light output section that outputs second polarized light; a first mask section that has formed therein a first aperture section that passes the first polarized light for exposing an orientation film and blocks the first polarized light; and a second mask section that has formed therein a second aperture section that passes the second polarized light for exposing the orientation film and blocks the second polarized light. The first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner.