Exposure Apparatus Multiple Exposure Positional Adjustment
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Solution Overview
Problem
Existing exposure apparatuses face challenges in efficiently performing multiple exposures on substrates due to the time required for mask exchange and illumination condition changes, which can lower operational rates and throughput, and require precise adjustment of positional relationships between substrate surfaces and image planes to form desired patterns.
Innovation Solution
An exposure apparatus with an optical system forming images of different patterns in separate exposure areas and an adjusting device to adjust the positional relationship between the substrate surface and image planes, as well as a detecting system to accurately position the image planes for multiple exposure processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple exposure is performed by exchanging masks or changing illumination conditions, then different patterns can be formed on the substrate, but the operational rate and throughput are lowered due to the time required for mask exchange and illumination condition changes
Solution Approach 1:
The patent combines multiple illumination conditions and multiple patterns into a single exposure process. The illumination system can switch between different illumination conditions (e.g., annular illumination, coherent illumination) without mask exchange, and the optical system can form multiple patterns (first pattern, second pattern, third pattern) in different exposure areas simultaneously or sequentially within one exposure cycle, thereby eliminating mask exchange time and improving throughput while maintaining pattern formation versatility
Solution Approach 2:
The illumination system is designed to perform multiple functions: it can provide different illumination conditions (annular, coherent, etc.) and support multiple exposure areas with different patterns using the same mask. This multi-functional illumination system eliminates the need for separate masks for different illumination conditions, thereby improving productivity while maintaining adaptability for forming various patterns
2Adaptability or versatility
If multiple exposure is performed by exchanging masks, then different patterns can be formed on the substrate, but the device complexity increases due to the need for multiple masks and mask exchange mechanisms
Solution Approach 1:
The patent merges the functions of multiple masks into a single mask that can be used with multiple illumination conditions. The single mask contains pattern data that can be exposed in different areas with different illumination conditions (annular, coherent, etc.), eliminating the need for multiple masks and the complex mask exchange mechanism, thereby reducing device complexity while maintaining pattern variety
Solution Approach 2:
The illumination system is designed to be dynamic, capable of switching between different illumination conditions (annular, coherent, etc.) and adjusting illumination parameters during the exposure process. This dynamic illumination system replaces the static multiple-mask approach, reducing mechanical complexity while maintaining the ability to form various patterns through optical control
3Adaptability or versatility
If multiple exposure is performed with different illumination conditions, then different patterns can be formed on the substrate, but the time required for illumination condition changes lowers the operational rate
Solution Approach 1:
The patent combines multiple illumination conditions into a single exposure process using one mask. The illumination system can switch between annular illumination, coherent illumination, and other conditions without interrupting the exposure process or requiring mask exchange. Multiple patterns are formed in different exposure areas using the same mask with different illumination conditions, thereby eliminating illumination condition change time and improving operational rate while maintaining illumination variety
Solution Approach 2:
The exposure process continues without interruption as the illumination system switches between different illumination conditions. The system maintains continuous exposure action by forming different patterns in different areas with different illumination conditions sequentially or simultaneously within one exposure cycle, eliminating idle time for illumination condition changes and improving operational rate while preserving illumination condition variety
Data Source
AI summary
An exposure apparatus includes a projection optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area; and an adjusting device which adjusts a surface positional relationship between a surface of the substrate and a first image plane for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate and a second image plane for forming the image of the second pattern thereon when a shot area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via the projection optical system. The substrate can be subjected to the multiple exposure satisfactorily and efficiently.