Exposure Beam Diameter Control for Illumination Uniformity
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Solution Overview
Problem
Long-term use of light exposer systems in photolithography processes leads to deterioration of the exposure beam generator, resulting in reduced illumination uniformity and exposure capacity, which increases manufacturing costs and affects the quality of display devices.
Innovation Solution
A light exposer configuration that includes an exposure beam generator with specific lens structures and a vacuum chamber, utilizing first and second fly eye lenses, and exposure beam diameter changing lenses to maintain stable illumination distribution and reduce energy density, thereby minimizing damage to the exposure beam generator over time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the exposure beam generator is used for a long period of time, then productivity is improved, but the illumination uniformity and exposure capacity deteriorate due to damage in the optic system
Solution Approach 1:
The patent applies preliminary action by adjusting the exposure beam diameter before it enters the optic system (prism). By enlarging the beam diameter in advance using a convex lens, the energy density is reduced before the beam reaches the prism, preventing damage before it occurs. This allows continuous operation without deterioration of illumination uniformity.
Solution Approach 2:
The patent changes the physical parameter of the exposure beam (diameter) to resolve the contradiction. By adjusting the beam diameter to be larger than a predetermined value, the energy density is reduced, which prevents damage to the optic system during long-term operation, thereby maintaining illumination uniformity and exposure capacity.
2Reliability
If the exposure beam diameter is enlarged, then the energy density is reduced and damage to the optic system is prevented, but the illumination intensity decreases
Solution Approach 1:
The patent changes the beam diameter parameter to prevent damage, and compensates for the intensity loss by adjusting the laser output power or using multiple passes. This allows the system to maintain both reliability and sufficient illumination intensity for effective exposure.
Solution Approach 2:
The patent ensures continuous useful action by maintaining the enlarged beam diameter throughout the exposure process, allowing the reduced energy density beam to still provide sufficient total energy for photolithography through extended exposure time or multiple scans, thereby maintaining effectiveness despite lower instantaneous intensity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures consistent illumination uniformity and extended lifespan of the exposure beam generator, optimizing productivity and quality in display device manufacturing by preventing damage and maintaining exposure capacity.
Implementation Method 1
a first exposure beam diameter changing lens positioned before the first prism and enlarging a diameter of the exposure beam
Implementation Method 2
a vacuum chamber passing the exposure beam generated by the exposure beam generator
Implementation Method 3
a first fly eye lens having a plurality of convex lens like fly eyes
Data Source
AI summary
A light exposer according to an embodiment of the present invention includes an exposure beam generator generating an exposure beam, and a vacuum chamber passing the exposure beam generated by the exposure beam generator and including a first fly eye lens having a plurality of convex lens like fly eyes. The exposure beam generator includes an oscillator including an oscillator pumping chamber, a first prism and a second prism, and a first exposure beam diameter changing lens positioned before the first prism and enlarging a diameter of the exposure beam.