Multi-Stage Exposure Control for Faster Substrate Alignment
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Solution Overview
Problem
Existing exposure apparatuses require significant operation time for alignment and transmission of correction data, which affects the cycle time of the exposure process.
Innovation Solution
An exposure apparatus with multiple substrate stages and a data controller that generates control data during the exposure process of one substrate while measuring and aligning a second substrate, allowing simultaneous processing and reducing the impact on cycle time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If correction data calculation and transmission are performed sequentially before exposure, then alignment precision is improved, but productivity deteriorates due to increased cycle time
Solution Approach 1:
The system performs measurement of the second substrate and generation of control data in advance during the exposure process of the first substrate. This preliminary action ensures that alignment precision is achieved before exposure while the data is ready for immediate use when the second substrate reaches the exposure position, eliminating idle time and maintaining productivity.
Solution Approach 2:
The exposure apparatus maintains continuous operation by overlapping the measurement and control data generation process for the second substrate with the exposure process of the first substrate. This continuity ensures that no time is wasted between completing measurements and starting the next exposure, thereby maintaining high productivity while achieving precise alignment.
2Productivity
If multiple substrates are processed simultaneously on multiple stages, then productivity is improved, but device complexity increases
Solution Approach 1:
The exposure apparatus is divided into multiple independent substrate stages, each capable of holding and processing substrates. This segmentation allows parallel processing of multiple substrates while keeping each stage's control and measurement systems relatively simple and modular, making the overall system manageable despite increased capacity.
Solution Approach 2:
Each substrate stage is designed with universal functionality to perform both exposure and measurement tasks. This multi-functionality reduces the need for separate dedicated measurement devices for each stage, thereby increasing productivity through parallel processing while limiting the increase in overall device complexity through functional integration.
Data Source
AI summary
An exposure apparatus that scans and exposes a substrate via an optical modulator in which a plurality of elements are controlled according to an image pattern, the exposure apparatus includes a first stage that supports a first substrate, a second stage that supports a second substrate different from the first substrate, a measurement part that measures information about the second substrate, and a generation part that generates control data, which controls the plurality of elements during scanning and exposing the second substrate, based on the information during an exposure process of the first substrate, wherein the measurement part measures the information about the second substrate during the exposure process of the first substrate.