Exposure Device Alignment Stage Unit Single-Microscope Positioning
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Solution Overview
Problem
Existing exposure devices for semiconductor and printed board manufacturing require extensive alignment processes, leading to increased processing time and device size due to the need for multiple alignment microscopes and complex stage movements, especially when dealing with large workpieces divided into many exposure areas.
Innovation Solution
The exposure device incorporates an alignment stage unit with a single-axis moving mechanism for the alignment stage and a separate exposure processing unit, utilizing a workpiece moving mechanism to transport the workpiece from the alignment stage to the exposure unit, reducing the number of alignment microscopes and the device's size while maintaining precise alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple alignment microscopes are used to detect workpiece marks in each exposure area, then alignment precision is improved, but device size and complexity increase
Solution Approach 1:
A single alignment microscope is designed to perform multiple functions by detecting workpiece marks in different exposure areas through sequential positioning. The alignment microscope moves to different locations (first exposure area, second exposure area, etc.) to detect multiple workpiece marks, replacing the need for multiple fixed alignment microscopes and thereby reducing device size while maintaining alignment precision
Solution Approach 2:
The alignment microscope is made movable rather than fixed, allowing it to dynamically reposition itself to detect workpiece marks in various exposure areas. This dynamic positioning capability enables one alignment microscope to fulfill the role of multiple static alignment microscopes, reducing overall device complexity
2Measurement precision
If alignment is performed for each exposure area sequentially, then alignment precision is maintained, but total exposure time increases
Solution Approach 1:
The alignment process is made continuous by moving the alignment microscope between exposure areas without interrupting the overall workflow. While the alignment microscope detects workpiece marks in one area, other systems can prepare for the next area, and the alignment microscope quickly repositions to the next area, maintaining continuous productive action rather than sequential interruption
Solution Approach 2:
Workpiece marks in different exposure areas are detected in advance before actual exposure begins. By performing alignment detection preliminarily and storing the detected positions, the system prepares alignment data ahead of time, allowing exposure to proceed without waiting for real-time alignment measurements during the exposure process
3Device complexity
If a single alignment microscope is used to detect workpiece marks in multiple exposure areas, then device size is reduced, but alignment time per area increases
Solution Approach 1:
The patent replaces complex mechanical systems with simpler, faster positioning mechanisms. Instead of using multiple heavy alignment microscopes that require complex mounting and adjustment mechanisms, a single alignment microscope uses automated, precise positioning systems to move between areas, reducing mechanical complexity while maintaining or improving alignment speed through automated control
Solution Approach 2:
The system optimizes alignment time by changing operational parameters such as the speed and precision of the alignment microscope's movement between areas. By adjusting these parameters and using efficient positioning algorithms, the system minimizes the time penalty associated with moving a single alignment microscope across multiple exposure areas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces the total exposure time and device size, lowering costs by minimizing the number of alignment microscopes and optimizing the alignment process, while ensuring precise alignment and efficient exposure across multiple workpiece areas.
Implementation Method 1
an alignment microscope that detects a workpiece mark formed on a workpiece and a mask alignment mark formed on a mask
Implementation Method 2
a projection lens for projecting the mask pattern on the workpiece
Implementation Method 3
the workpiece is irradiated with light, including exposure light, through the mask
Data Source
AI summary
An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask; and an exposure stage that holds the workpiece. The workpiece moving mechanism moves the workpiece from the alignment stage unit to the exposure processing unit.