Exposure Device Micro Lens Layer Reduced Real Image
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The manufacturing of display panels faces challenges in improving exposure process precision and resolution due to cost limitations and design specifications of exposure apparatus and mask plates.
Innovation Solution
An exposure device is designed with a first micro lens layer forming a reduced real image of the mask pattern, which is then projected onto a substrate, utilizing a second micro lens layer for uniform light output and optionally a projection lens for further enhancement, thereby increasing precision and resolution without altering the mask plate or main exposure machine components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional exposure apparatus and mask plate design specifications are used, then equipment cost and development cost are reduced, but exposure precision and resolution cannot be improved
Solution Approach 1:
A micro lens array is introduced as an intermediary component between the mask plate and the substrate. This micro lens array acts as a mediator that transforms the optical path, enabling super-resolution exposure without requiring changes to the main exposure apparatus or mask plate design, thus resolving the contradiction between improving exposure precision and maintaining equipment simplicity
Solution Approach 2:
The exposure system is segmented by adding a micro lens array composed of multiple independent micro lenses. Each micro lens processes light independently to create multiple focused spots, achieving high-resolution patterning without requiring the entire exposure apparatus to be redesigned, thereby improving precision while limiting device complexity increase
2Manufacturing precision
If conventional exposure apparatus and mask plate design specifications are used, then equipment cost is reduced, but exposure resolution cannot be improved
Solution Approach 1:
The micro lens array serves as a manufacturable intermediary that can be produced separately and integrated into the existing exposure system. This approach allows resolution improvement without requiring re-manufacturing of expensive main exposure apparatus components, maintaining ease of manufacture while achieving higher resolution
Solution Approach 2:
The micro lens array creates multiple copied focal points from a single mask pattern, effectively multiplying the resolution capability. This copying mechanism allows high-resolution exposure to be achieved through a relatively simple and manufacturable component rather than requiring complex modifications to the main exposure system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances exposure precision and resolution while reducing equipment and development costs, allowing for finer exposure patterns with larger mask patterns and more uniform energy distribution.
Implementation Method 1
The first micro lens layer utilizes light that passes through the mask plate to form a reduced real image of the mask pattern
Implementation Method 2
The first micro lens layer comprises a plurality of first micro lenses, the plurality of first micro lenses are convex lenses
Implementation Method 3
the second micro lens layer is used for causing the light that forms the real image to be outputted uniformly
Implementation Method 4
the second micro lens layer comprises a plurality of second micro lenses, the second micro lens comprises a second upper micro lens and a second lower micro lens integrated with each other
Data Source
AI summary
The present invention discloses an exposure device including: a mask plate, on which a mask pattern is provided; and a first micro lens layer, provided at a light outputting side of the mask plate, wherein the first micro lens layer utilizes light that passes through the mask plate to form a reduced real image of the mask pattern, the real image is located at one side of the first micro lens layer, and the mask plate is located at other side of the first micro lens layer. In the present invention, by utilizing the characteristics of micro lenses, a reduced real image for the mask patter is formed and then projected onto the substrate to be exposed, which effectively increases precision and resolution of exposure and reduces equipment cost and development cost.