Exposure Device Gas Handling for Ozone Reduction
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Solution Overview
Problem
The efficiency of substrate exposure processing is degraded due to ozone generation when oxygen is present in the path of vacuum ultraviolet rays, requiring a long time to discharge oxygen molecules and lower oxygen concentration in the exposure device, which affects the processing time and efficiency.
Innovation Solution
An exposure device with a processing chamber that exhausts gas and supplies inert gas to lower oxygen concentration, allowing the substrate to be moved closer to the light emitter for efficient exposure, and includes a pressure controller to match the pressure in the light emitter with the processing chamber, preventing stress on the window member and improving transmittance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If gas in the processing chamber is exhausted to lower oxygen concentration, then ozone generation is prevented, but processing time is extended
Solution Approach 1:
The platform is moved to the second position (exposure position) before the oxygen concentration in the processing chamber is fully reduced. The exposure operation is performed during the gas exchange process, rather than waiting for complete oxygen removal. This preliminary action reduces the overall processing time while still preventing significant ozone generation during the actual exposure.
Solution Approach 2:
The system dynamically adjusts the exposure timing based on the real-time oxygen concentration in the processing chamber. The exposure operation is performed when the oxygen concentration reaches an acceptable level during the gas exchange process, rather than following a fixed sequence. This dynamic approach optimizes the balance between preventing ozone generation and minimizing processing time.
2Productivity
If the platform is moved closer to the light emitter, then exposure efficiency is improved, but the window member is subjected to stress
Solution Approach 1:
The pressure controller equalizes the pressure between the light emitter and the processing chamber, creating a pressure-balanced state. This eliminates the pressure difference that would otherwise cause stress on the window member when the platform is positioned close to the light emitter for efficient exposure.
Solution Approach 2:
The system changes the pressure parameter dynamically - maintaining pressure equality between the light emitter and processing chamber during exposure operations. This parameter adjustment allows the platform to be positioned optimally close to the light emitter without subjecting the window member to damaging stress from pressure differentials.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for faster oxygen concentration reduction, improving exposure processing efficiency and prolonging the life of the window member by preventing stress and maintaining high transmittance.
Implementation Method 1
when oxygen is present in the path of the vacuum ultraviolet rays with which the substrate is irradiated, an oxygen molecule that receives the vacuum ultraviolet rays is separated into oxygen atoms, and a separated oxygen atom is recoupled with another oxygen molecule. Thus, ozone is generated.
Implementation Method 2
the gas in the processing chamber is replaced with the inert gas, and the oxygen concentration is lowered
Implementation Method 3
a light emitter that emits vacuum ultraviolet rays
Implementation Method 4
a driver that moves the platform between a first position and a second position such that the platform is located at the first position in the processing chamber when the substrate is carried into or carried out from the processing chamber, and moves the platform between the first position and the second position such that the platform is located at the second position that is closer to the light emitter than the first position when the substrate is irradiated with the vacuum ultraviolet rays by the light emitter
Data Source
AI summary
Exhaust of gas in the processing chamber is started by a gas exhaust section, and supply of an inert gas into the processing chamber is started by a gas supply section after a predetermined time length has elapsed since the exhaust of gas is started. Alternatively, the gas in the processing chamber in which a substrate is stored is exhausted by the gas exhaust section, the inert gas is supplied into the processing chamber by the gas supply section, and the pressure in a light emitter that has a light-transmitting plate is allowed to match or be close to the pressure in the processing chamber. The substrate in the processing chamber is irradiated with vacuum ultraviolet rays by the light emitter with an oxygen concentration in the gas in the processing chamber lowered to a predetermined concentration. Thus, the substrate is exposed.