Exposure Machine Shielding Device for Particle Contamination Control

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Solution Overview

Problem

Exposure machines in semiconductor integrated circuit manufacturing face contamination issues due to particles entering through openings, leading to reduced product yield rates during wafer exposure.

Innovation Solution

An exposure machine design incorporating a machine platform with a recess portion, a shielding device made of transparent resin, and a drive device that controls the shielding device to open and close the top opening, preventing particle entry and ensuring a clean environment for the mask.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If the top opening is left open for mask carrier placement, then the ease of operation is improved, but particles can enter through the opening and contaminate the mask, reducing product yield rate

Engineering Contradiction:
Improvemask carrier placementVSAvoidparticle contamination
Core Design Contradiction:
Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The shielding device is designed to be movable rather than fixed, allowing it to dynamically switch between covering the top opening during storage and exposing it during mask carrier placement. This dynamic configuration enables the system to adapt its state based on operational needs, preventing particle contamination when the opening is not in use while maintaining ease of operation when needed.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The shielding device acts as an intermediary element between the external environment and the mask carrier placement area. It temporarily blocks the top opening to prevent particle entry and can be moved aside when mask carrier placement is required, thus mediating between the conflicting requirements of contamination prevention and operational accessibility.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the shielding device covers the top opening to prevent particle entry, then the product yield rate is improved, but the mask carrier cannot be placed on the placement table

Engineering Contradiction:
Improveproduct yield rateVSAvoidmask carrier placement
Core Design Contradiction:
ProductivityVSEase of operation

Solution Approach 1:

The shielding device's movable design allows it to transition between a closed position that prevents particle contamination and an open position that enables mask carrier placement. This dynamic capability resolves the contradiction by showing that the shielding function does not permanently block access, but can be adjusted according to operational requirements.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The shielding device is positioned in advance to cover the top opening and prevent particle contamination before mask carrier placement is needed. When placement is required, the device is moved aside in a controlled manner, ensuring that the environment remains clean during normal operation while allowing access when needed.

Inventive Principle:
Principle #10Preliminary action

3Ease of operation

If the top opening is always open for access, then the ease of operation is improved, but particles continuously enter and contaminate the mask

Engineering Contradiction:
Improveaccess to placement tableVSAvoidmask cleanliness
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The system transitions from a static open configuration to a dynamic system where the top opening can be covered by the shielding device. This dynamic adjustment allows the placement table to be accessible when needed while maintaining mask cleanliness during normal operation, resolving the contradiction between continuous access and contamination prevention.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The shielding device serves as an intermediary that can be introduced between the external environment and the placement area to prevent particle contamination. It can be moved aside when access is required, thus mediating between the need for continuous accessibility and the requirement to maintain a clean environment for mask reliability.

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS11662667B2Exposure machine
Publication Date: 2023.05.30 CHANGXIN MEMORY TECH INC
  • US11662667B2 patent drawing
  • US11662667B2 patent drawing
  • US11662667B2 patent drawing

AI summary

The present application provides an exposure machine, relates to semiconductor integrated circuit manufacturing technologies. The exposure machine includes a machine platform, a shielding device, and a drive device; the machine platform is provided with a recess portion, the recess portion has a top opening, a base and a placement table are disposed in the recess portion, the placement table is configured to carry a mask carrier, and the mask carrier can be placed on the placement table through the top opening; and the machine platform is further provided with a drive device and a movable shielding device, when the shielding device is at an initial position, the shielding device covers the top opening, and when the mask carrier needs to be placed on the placement table through the top opening, the drive device opens the shielding device to expose the top opening.