Exposure Mask Correcting Patterns for Lithography Direction Error
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Solution Overview
Problem
The increasing resolution and decreasing pattern size in display devices during photolithography processes lead to errors in the exposure direction of exposure apparatuses, necessitating a solution to reduce these errors.
Innovation Solution
An exposure mask with a pattern part and surrounding correcting pattern parts disposed in specific pitches and shapes, used to correct the light supply direction of the exposure apparatus by forming exposure patterns and determining errors based on their alignment and deviation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the resolution of the display device is increased and the pattern size is decreased, then the display device performance is improved, but the error in the exposure direction of the exposure apparatus increases
Solution Approach 1:
The patent divides the exposure mask into multiple regions: a pattern part containing the actual device patterns and a surrounding part containing multiple correcting pattern parts. Each correcting pattern part includes multiple correcting patterns arranged in specific directions. This segmentation allows independent measurement and correction of exposure direction errors without affecting the main pattern fabrication.
Solution Approach 2:
The correcting pattern parts serve as intermediary elements that mediate between the exposure apparatus and the main pattern part. By exposing these correcting patterns and measuring their alignment, the system can determine exposure direction errors and apply corrections before fabricating the actual device patterns, thus indirectly improving the overall exposure accuracy.
2Measurement precision
If correcting pattern parts are added to the exposure mask, then the exposure direction error is reduced, but the device complexity increases
Solution Approach 1:
The correcting pattern parts are placed only in the surrounding part of the exposure mask, not throughout the entire mask. The correcting patterns are arranged in specific locations along edges of the pattern part, with different arrangements in different directions. This localized approach provides the necessary measurement capability while minimizing the overall complexity increase.
Solution Approach 2:
The correcting pattern parts serve multiple functions: they act as alignment references for determining exposure direction errors, provide measurement targets for both horizontal and vertical directions, and enable correction calculations. This multi-functionality reduces the need for separate measurement systems, thereby limiting the complexity increase.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces errors in the exposure direction of the exposure apparatus, enhancing the accuracy of the exposure process by correcting the light supply direction using the exposure mask's correcting pattern parts.
Implementation Method 1
exposing light in the primarily corrected light supply direction, forming a plurality of exposure patterns by exposing light to a plurality of correcting pattern parts
Data Source
AI summary
An exposure mask includes a pattern part exposed to light to form a pattern on a substrate, a surrounding part that surrounds a periphery of the pattern part, and correcting pattern parts disposed on the surrounding part. The correcting pattern parts are disposed in a line along an edge of the pattern part. A correcting method of an exposure apparatus includes correcting a light supply direction of a light supply unit based on a movement direction and a speed of the light supply unit, exposing light in the corrected light supply direction, forming exposure patterns by exposing light to correcting pattern parts, determining whether an error occurs in the light supply direction by using the exposure patterns, and correcting the light supply direction based on the determined error.