Exposure Apparatus Overlapping Spot Deflection
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Solution Overview
Problem
Existing exposure systems for photosensitive layers struggle to maximize exposure performance by generating the largest number of exposure spots per unit of time with precision.
Innovation Solution
The exposure system allows for the deflection of exposure spots transversely to the row direction, with the last exposure spot of one deflection path and the first of the next path arranged parallel to the feed direction, enabling overlapping exposure spots and simultaneous positioning using multiple exposure units with aligned beams and shared deflection units.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the deflection direction runs obliquely to the feed direction with exposure spots arranged parallel to a reference line, then a large number of exposure spots can be generated simultaneously with precise positioning, but the system complexity increases due to coordinated control of multiple exposure units and deflection units
Solution Approach 1:
The exposure system is divided into multiple independent exposure units, each with its own exposure beam and deflection unit. This segmentation allows parallel processing of multiple exposure spots simultaneously, dramatically increasing productivity while maintaining manageable complexity through modular architecture
Solution Approach 2:
The deflection direction is arranged obliquely to the feed direction, creating a two-dimensional exposure spot arrangement pattern. This dimensional approach allows exposure spots to be positioned in both the feed direction and transverse direction simultaneously, maximizing the number of spots that can be exposed in parallel
2Manufacturing precision
If multiple exposure units with row of radiation exit regions are used to generate exposure spots transversely to the feed direction, then exposure precision is improved, but the time required to position and deflect multiple exposure spots increases
Solution Approach 1:
Multiple exposure units are pre-positioned with their radiation exit regions arranged in rows, and deflection units are pre-configured with mirror surfaces oriented at specific angles. This preliminary arrangement eliminates the need for real-time positioning adjustments, allowing all exposure spots to be generated simultaneously without time loss
Solution Approach 2:
Mechanical positioning systems are replaced with optical deflection using mirror surfaces. The deflection units use optical reflection to rapidly redirect exposure beams to precise positions without mechanical movement, dramatically reducing positioning time while maintaining high precision
3Adaptability or versatility
If exposure beams are deflected by deflection units with mirror surfaces oriented at different angles, then exposure spots can be positioned in oblique directions, but the alignment precision required increases
Solution Approach 1:
Each deflection unit is equipped with mirror surfaces having specific local orientations tailored to its position and function. This localized optimization allows each unit to deflect beams at precisely the angle needed for its specific exposure spots, achieving high alignment precision while maintaining overall system versatility
Solution Approach 2:
The mirror surface orientation angles are carefully selected and adjusted as key parameters to achieve optimal beam deflection. By changing these angular parameters systematically, the system achieves both flexible deflection directions and high alignment precision through mathematical optimization of the optical paths
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the generation of a large number of exposure spots simultaneously, ensuring precise positioning and overlapping for coherent structure production across the photosensitive layer, enhancing exposure performance and efficiency.
Implementation Method 1
each of which can be deflected by a deflection unit in a deflection direction running obliquely to the feed direction
Implementation Method 2
from which an exposure spot can be generated on the photosensitive layer with each guided through imaging optics
Implementation Method 3
influence the photochemical processes in the photosensitive layer to the same extent as possible
Data Source
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AI summary
In order that an exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object, comprising an object carrier and an exposure device, wherein the object carrier and the exposure device can be moved relative to one another in an advance direction and wherein exposure spots can be produced on the photosensitive layer in a position-controlled manner by means of the exposure device transversely with respect to the advance direction, is improved in such a way that a highest possible exposure power is available, i.e. a largest possible number of exposure spots can be produced per unit time, it is proposed that the exposure device has at least one exposure unit with a series of radiation exit regions which are arranged successively in a series direction and from which exposure beams emerge, by means of each of which, passed through an imaging optical system, an exposure spot can be produced on the photosensitive layer and each of which can be deflected by a deflection unit in a deflection direction running transversely with respect to the series direction, such that each exposure beam can produce exposure spots that at least partly overlap one another in a multiplicity of successive exposure spot positions in the deflection direction.