Image Forming Apparatus Exposure Pattern Selection

The patent applies dynamics by making the exposure pattern variable and adaptable. Instead of using a fixed pulse width modulation pattern, the system dynamically selects from multiple exposure patterns (first through fourth patterns) based on the specific imaging conditions and pixel characteristics. This dynamic adaptation allows suppression of sweeping and edge effect while minimizing radiation noise by choosing the most appropriate pattern for each situation.

The patent changes exposure parameters by defining multiple distinct exposure patterns with different characteristics. Each pattern (first, second, third, fourth) has different exposure timing and intensity parameters. The system selects and switches between these patterns based on imaging conditions, thereby changing the exposure parameters adaptively to suppress harmful effects while maintaining image quality and reducing radiation noise.

The patent applies preliminary action by pre-defining multiple exposure patterns (first through fourth patterns) with different characteristics before actual image formation. These patterns are prepared in advance in the control unit, allowing the system to quickly select the most appropriate pattern based on imaging conditions without complex real-time calculations, thereby reducing control complexity while still effectively minimizing consecutive non-exposure regions and radiation noise.

The patent manages device complexity by organizing exposure parameter variations into a finite set of predefined patterns. Instead of allowing continuous parameter adjustment which would increase complexity, the system uses discrete pattern selection (first, second, third, fourth patterns) with specific characteristics. This parameter discretization simplifies the control logic while maintaining the ability to adapt to different imaging conditions and minimize radiation noise.