Exposure Tool Positioning With Machine-Learned Thermal Compensation
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Solution Overview
Problem
Conventional photolithography exposure tools face limitations in scalability due to thermal aberrations caused by optical lenses expanding under prolonged laser exposure, which are currently compensated using fixed physical models that are inadequate.
Innovation Solution
A machine learning algorithm is employed to analyze exposure tool data, constructing a regression model that predicts thermal aberrations by training on key factors, allowing for improved compensation of exposure positions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a fixed physical model is used to calculate thermal aberrations, then the calculation can be performed, but the scalability is limited
Solution Approach 1:
The patent changes the approach from using fixed physical parameters in a deterministic model to using data-driven parameter relationships learned from historical exposure data. The machine learning model captures complex parameter interactions and thermal behavior patterns that cannot be expressed by fixed physical equations, enabling both scalability to different exposure conditions and improved prediction accuracy through pattern recognition in the data
Solution Approach 2:
The patent replaces the mechanical/physical calculation system with an information processing system. Instead of relying on physical models and equations to calculate thermal aberrations, the system uses machine learning algorithms that process historical exposure data to predict thermal offsets. This substitution enables the system to scale to different exposure tools and conditions while maintaining or improving accuracy through data-driven insights
2Productivity
If optical lenses are exposed to laser light for a long period, then exposure imaging can be performed, but thermal aberrations occur due to lens expansion
Solution Approach 1:
The patent implements a feedback mechanism where historical exposure data, including actual thermal offset measurements, are fed into a machine learning model. The model learns from this feedback to continuously improve its predictions of thermal aberrations. This closed-loop approach allows the system to maintain exposure imaging capability while progressively improving exposure position accuracy by adapting to actual thermal behavior patterns observed during operation
Solution Approach 2:
The patent performs preliminary action by training the machine learning model on historical exposure data before actual exposure operations. The model pre-learns the relationship between exposure parameters and thermal offsets, enabling it to predict and compensate for thermal aberrations before they occur during actual imaging. This preliminary training phase establishes the predictive capability that maintains precision during subsequent productivity-focused operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enhances the accuracy of thermal aberration compensation, improving scalability and reducing resource waste in semiconductor manufacturing by optimizing the exposure position of the exposure tool.
Implementation Method 1
optical lenses are heated and expand when exposed to laser light for a long period of time, thereby changing their focal position and affecting exposure imaging and causing thermal aberrations
Data Source
AI summary
A method for determining the exposure position of an exposure tool, performed by a computer device. The method includes training a regression model based on raw data of the exposure tool with a plurality of key factors that affect the actual offset value of the exposure tool. The method also includes using the trained regression model to calculate the predicted offset value based on the raw data. The method also includes compensating for the exposure position of the exposure tool based on the predicted offset value to adjust the exposure position of the exposure tool.


