Exposure Apparatus Shutter Control for Dose Accuracy
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Solution Overview
Problem
Existing exposure apparatuses face challenges in achieving high exposure dose accuracy while maintaining throughput, particularly in scenarios where the required exposure time is shorter than the reference time, leading to inefficiencies in shutter operation and light intensity adjustment.
Innovation Solution
The exposure apparatus incorporates a controller that adjusts exposure time and light intensity based on two modes: one where the shutter operation is controlled by exposure dose sensor output and another where shutter speed is controlled to ensure accurate exposure, allowing for adaptive light intensity adjustment to meet varying exposure requirements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the shutter is closed without counting pulses to improve throughput, then productivity increases, but exposure dose accuracy deteriorates
Solution Approach 1:
The patent applies dynamics by making the shutter control strategy adaptive rather than fixed. The system dynamically switches between two control modes: pulse counting mode (for high accuracy when exposure time is short) and time-based mode (for high throughput when exposure time is long). This dynamic adaptation resolves the contradiction by optimizing the control approach based on real-time exposure requirements.
Solution Approach 2:
The patent changes the control parameter from fixed pulse counting to variable time-based control. By introducing a reference time threshold and switching between counting-based and time-based shutter control, the system adjusts the control parameter (exposure time vs. pulse count) to resolve the contradiction between throughput and accuracy.
2Manufacturing precision
If light intensity is decreased to improve exposure dose accuracy, then manufacturing precision increases, but productivity deteriorates
Solution Approach 1:
The system dynamically adjusts light intensity based on the required exposure time. When the required exposure time is long, the system uses full light intensity to maintain throughput. When the required exposure time is short, the system decreases light intensity to improve exposure dose accuracy. This dynamic adjustment resolves the contradiction between productivity and manufacturing precision.
Solution Approach 2:
The patent introduces variable light intensity control as a parameter change mechanism. By adjusting the light intensity parameter based on the reference time comparison, the system optimizes exposure conditions to simultaneously achieve high throughput and high exposure dose accuracy, resolving the contradiction between these two parameters.
3Productivity
If the shutter operation speed is increased to reduce exposure time, then productivity improves, but exposure dose accuracy deteriorates
Solution Approach 1:
The system dynamically controls shutter operation speed based on the required exposure time. For long exposure times, the shutter operates at normal speed to maintain accuracy. For short exposure times, the system switches to time-based control with appropriate shutter speed to ensure both speed and accuracy. This dynamic control resolves the contradiction between productivity and exposure dose accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances throughput while maintaining exposure dose accuracy by dynamically adjusting exposure parameters, ensuring optimal exposure times and intensities based on specific requirements, thereby improving overall process efficiency.
Implementation Method 1
an exposure dose sensor configured to detect an exposure dose on the substrate
Data Source
AI summary
An exposure apparatus includes a shutter, an exposure dose sensor configured to detect an exposure dose on a substrate, and a controller configured to control an exposure operation in accordance with control modes of the shutter, which include a first mode in which an exposure time of the substrate is controlled by opening the shutter and thereafter closing the shutter based on the output from the exposure dose sensor, and a second mode in which the exposure time of the substrate is controlled by controlling an operation speed of the shutter based on control information determined in advance based on a target.