Exposure Unit Light Adjustment for Relief Plate Uniformity

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Solution Overview

Problem

Existing exposure units for relief plate precursors using UV light sources often result in non-uniform light intensity distribution, leading to suboptimal printing results due to variations in floor thickness and exposure during both front and back exposure processes.

Innovation Solution

An exposure unit with a support structure and a plurality of UV light sources, featuring a light adjustment structure that blocks and/or reflects light to achieve uniform light intensity across the support surface, utilizing elongated UV light tubes and a grid or bridge structure to control light distribution, ensuring more uniform exposure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If UV light sources are used for exposing relief plate precursors, then exposure can be achieved, but light intensity distribution becomes non-uniform

Engineering Contradiction:
Improvelight intensity distributionVSAvoidexposure uniformity
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by varying the light transmission properties at different locations of the support structure. The support structure has a first region with lower light transmission and a second region with higher light transmission, creating non-uniform light distribution that compensates for the natural non-uniformity of UV light sources. This ensures uniform exposure across the relief plate precursor.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The support structure acts as an intermediary element between the UV light sources and the relief plate precursor. By incorporating light diffusing elements and varying light transmission regions in the support structure, it mediates the light distribution to achieve uniform exposure on the precursor while maintaining the benefit of using UV light sources.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If light adjustment structure is added to achieve uniform light distribution, then exposure uniformity improves, but device complexity increases

Engineering Contradiction:
Improveexposure uniformityVSAvoidstructure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent merges the light adjustment function with the support structure itself. The support structure incorporates light diffusing elements and varying light transmission regions directly into its design, combining structural support and light modulation functions into a single integrated component. This reduces device complexity compared to adding separate light adjustment mechanisms.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The support structure serves multiple functions: it provides mechanical support for the relief plate precursor, acts as a light diffusing element, and creates non-uniform light transmission to compensate for light source non-uniformity. This multi-functionality eliminates the need for separate components, reducing overall device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution provides a more uniform light intensity distribution, improving the quality of the relief plate precursor by ensuring consistent exposure, particularly at the edges and center areas, thereby enhancing the development process and final printing results.

Implementation Method 1

The mechanical structure (20) is configured to block a portion of the light emitted by the plurality of UV light sources (16)

Methodology Applied
Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 2

a light adjustment structure configured to block and/or reflect light

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 3

a plurality of UV light sources arranged next to each other and configured to emit UV light

Methodology Applied
Scientific EffectLight emission: Light

Implementation Method 4

Those photocurable layers are cured by exposure to electromagnetic radiation

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS20240264531A1Exposure unit with improved light intensity uniformness for exposing a relief plate precursor
Publication Date: 2024.08.08 XSYS PREPRESS NV
  • US20240264531A1 patent drawing
  • US20240264531A1 patent drawing
  • US20240264531A1 patent drawing

AI summary

An exposure unit for exposing a relief plate precursor includes a support structure with a support surface configured for supporting a relief plate precursor, and a plurality of UV light sources arranged next to each other and configured to emit UV light to a side of the relief plate precursor. The plurality of UV light sources cover a light source area parallel to the support surface. A light adjustment structure is configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources so as to render a light intensity measured in the support surface more uniform as compared to a situation without the light adjustment structure. The light adjustment structure is arranged at least partially between the light source area and the support surface.