Extendable Lens Alignment via X-Y Capacitance Measurement
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Solution Overview
Problem
In photolithography processes for semiconductor and display device manufacturing, thermal expansion and contraction of image projection systems cause shifts in lens positions, leading to incorrect pattern formation on substrates, which affects the accuracy of electrical feature creation on large area substrates like LCDs.
Innovation Solution
A photolithography system with extendable lenses and a plate having openings and sensors/targets to measure distances between the lenses and plate elements, allowing for real-time compensation of lens shifts and maintaining pattern accuracy by adjusting the lens position and chuck movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the lens is extended closer to the substrate for focusing, then the image quality is improved, but the lens position shifts due to thermal expansion/contraction causing pattern misalignment
Solution Approach 1:
The patent employs sensors to detect the actual position of the lens relative to the substrate and feeds this information back to the control system. The control system then adjusts the lens position or substrate position to compensate for thermal drift, ensuring accurate pattern alignment while maintaining the ability to extend the lens close to the substrate for high-quality imaging.
Solution Approach 2:
The patent introduces sensors and control systems as intermediary elements between the lens and substrate. These intermediaries measure the relative position and enable real-time compensation for thermal expansion/contraction, allowing the lens to be extended close to the substrate without compromising alignment accuracy.
2Productivity
If multiple image projection systems are used to cover large area substrates, then the productivity is improved, but the complexity of measuring and compensating lens shifts increases
Solution Approach 1:
The patent implements a universal measurement and compensation system that can be applied to multiple image projection systems simultaneously. The same sensor type and control methodology are used across all projection systems, allowing standardized measurement of lens shifts and coordinated compensation, thereby managing complexity while maintaining high throughput.
Solution Approach 2:
The patent combines the measurement and compensation functions into an integrated system that operates across multiple image projection systems. By merging the control logic and using coordinated adjustment of multiple systems, the patent reduces overall complexity compared to independent measurement and compensation for each system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures accurate pattern formation on substrates by detecting and compensating for lens shifts, thereby improving the precision and reliability of photolithography processes, especially for large area substrates like LCDs.
Implementation Method 1
measuring one or more distances between the lens and the one or more elements
Data Source
AI summary
Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, a photolithography system includes a plurality of image projection systems each having an extendable lens, and a plate having a plurality of openings. Each extendable lens is configured to be extended through a corresponding opening of the plurality of openings during operation. The plate includes one or more elements disposed adjacent each opening and each lens includes one or more elements formed thereon. The one or more elements formed on the plate and the one or more elements formed on the lens are utilized to measure one or more distances between the lens and the plate. Any deviation of the measured distance from a reference distance indicates that the lens has been shifted. Measures to compensate for the shifting of the lens will be performed.