Extendible Deposition Mask Structure for Reduced Shadow Effects
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Solution Overview
Problem
Existing deposition methods for display apparatuses face challenges in achieving high resolution and minimizing shadow effects, particularly in maintaining the deposition mask close to the substrate without gaps during the deposition process.
Innovation Solution
A deposition mask with a clamping portion at opposite ends, allowing for extension in the length direction, and a recess area that remains non-extended, maintaining a consistent pattern of deposition holes. This configuration ensures that the deposition mask is stretched and bonded to a frame, reducing the likelihood of gaps between the mask and the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the deposition mask is positioned close to the substrate to minimize shadow effects, then deposition quality is improved, but the mask structure becomes more complex requiring extension mechanisms
Solution Approach 1:
The deposition mask is designed with an extendable structure that can dynamically change its length. The mask includes a first area that can be extended in the length direction by applying force to clamping portions, allowing the mask to adapt its configuration to maintain close proximity to the substrate while managing structural complexity through controlled deformation.
Solution Approach 2:
The mask structure utilizes changes in physical parameters, specifically the length direction dimension, by extending the first area when force is applied to the clamping portions. This parameter change allows the mask to achieve the necessary proximity to the substrate for high-quality deposition while the recess area remains non-extended to maintain pattern consistency.
2Manufacturing precision
If the deposition mask is extended in the length direction to reduce gaps with the substrate, then deposition precision is improved, but the pattern alignment becomes more difficult to maintain
Solution Approach 1:
The deposition mask is segmented into distinct functional areas: a first area that extends in the length direction to reduce gaps with the substrate, and a recess area that remains non-extended to maintain stable pattern alignment. The pattern portions are specifically arranged with different spacing characteristics in these two areas, allowing the extending portion to compensate for gaps while the recess area preserves pattern consistency.
Solution Approach 2:
Different regions of the mask are assigned different functional properties: the first area has extendable properties to reduce gaps and improve deposition precision, while the recess area maintains fixed, non-extended properties to ensure stable pattern alignment. The pattern portions reflect this local quality difference with adjusted spacing between adjacent pattern portions in the extendable area versus the recess area.
3Object-affected harmful factors
If the mask structure is made extendable to maintain close proximity to substrate, then shadow effects are reduced, but the manufacturing process becomes more complex
Solution Approach 1:
The mask incorporates a dynamic extension mechanism where force applied to clamping portions extends the first area in the length direction, allowing the mask to adapt its position relative to the substrate. This dynamic capability reduces shadow effects by maintaining close proximity, while the segmented design with recess areas provides manufacturing flexibility.
Solution Approach 2:
The mask is divided into extendable first areas and non-extended recess areas, allowing selective extension to reduce shadow effects without requiring complete structural redesign. The pattern portions are distributed across these segmented areas with appropriate spacing, enabling the extension function to be implemented in a manufacturable way that addresses shadow effects while controlling manufacturing complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces shadow effects and ensures high-resolution thin film deposition by maintaining the deposition mask in close proximity to the substrate, thereby improving the overall quality of the display apparatus.
Implementation Method 1
vaporizing or subliming organic material by using a deposition source so that the organic material may be deposited on the substrate to form the organic thin film thereon
Implementation Method 2
vaporizing or subliming organic material by using a deposition source
Implementation Method 3
a first area thereof elongated in a length direction of the deposition mask to define a clamping portion which is at opposite ends of the deposition mask in the length direction and to which a force is applied to extend the deposition mask in the length direction thereof, the first area being extended in the length direction by the force applied to the clamping portion
Data Source
AI summary
A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. When the force is applied to the clamping portion, the deposition mask is extended in the length direction thereof and defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.