Lithographic Micro-Lens Arrays Using Extra Lenslets for Misalignment Gaps

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Solution Overview

Problem

Existing lithographic projection systems face challenges in maintaining precise alignment and positioning of lens arrays, leading to gaps and inefficiencies in patterning processes, particularly when dealing with small feature sizes and misalignments.

Innovation Solution

The use of a first and second micro-lens array with additional lenslets to fill gaps caused by positional or rotational misalignments, combined with scanning techniques such as overscanning and adjusting scan angles, to increase tolerances and ensure complete pattern coverage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If lens arrays are used for patterning, then manufacturing precision is improved, but alignment tolerance deteriorates

Engineering Contradiction:

Improvepatterning precisionVSAvoidalignment tolerance

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The lens array is divided into multiple independent lens elements arranged in specific patterns. Each lens element can be independently positioned and adjusted, allowing the system to maintain high patterning precision while accommodating larger overall alignment tolerances through modular adjustment capabilities.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system employs dynamic adjustment mechanisms that allow real-time modification of lens array positioning and configuration. This enables the system to adapt to alignment variations during operation, maintaining patterning precision even when initial alignment tolerances are larger than traditional systems.

Inventive Principle:

Principle #15Dynamics

2Manufacturing precision

If strict alignment tolerances are maintained, then patterning quality is improved, but system complexity increases

Engineering Contradiction:

Improvepatterning qualityVSAvoidalignment control complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The lens array system incorporates self-alignment features where the optical design inherently guides components into proper positions. This self-correcting mechanism reduces the need for complex external alignment control systems while maintaining high patterning quality.

Inventive Principle:

Principle #25Self-service

Solution Approach 2:

The system utilizes optical parameter variations (such as focal length, aperture, and wavelength) to achieve tolerance compensation. By adjusting these parameters, the system can maintain patterning quality without requiring equally precise mechanical alignment, thereby reducing overall system complexity.

Inventive Principle:

Principle #35Parameter changes

3Manufacturing precision

If misalignment gaps occur in patterns, then productivity is reduced, but alignment precision requirements increase

Engineering Contradiction:

Improvealignment precisionVSAvoidpatterning throughput

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The system performs preliminary alignment adjustments and compensations before the actual patterning process begins. This pre-positioning of lens elements and pre-calculation of alignment offsets ensures that no gaps occur during patterning, maintaining both high precision and continuous productivity without interruptions.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent introduces intermediary computational algorithms that calculate and compensate for potential misalignment gaps before they occur. These software-based intermediaries translate desired pattern outcomes into adjusted lens positioning commands, ensuring gap-free patterning while maintaining productivity.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly enhances the alignment and positioning tolerances, reducing gaps and improving the efficiency of patterning processes, particularly for small features, thereby enhancing the throughput and quality of lithographic manufacturing.

Implementation Method 1

delivering light through the lenslets of the first MLA and second MLA to the substrate

Methodology Applied

Scientific EffectOptical focusing: Lens

Data Source

PatentUS12461449B2Systems and methods for lithographic tools with increased tolerances

Publication Date: 2025.11.04 ASML NETHERLANDS BV

AI summary

A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.