Eye Model Ocular Length Measurement Wavefront Aberration Accuracy

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Solution Overview

Problem

Current methods for determining optical aberrations of the eye, such as those using the Tscherning aberrometer, rely on model assumptions for ocular length, leading to inaccuracies in computing defective vision, especially when the actual ocular length differs from the assumed value, resulting in errors in wavefront measurements and subsequent vision correction treatments.

Innovation Solution

The process involves reconstructing wavefront aberrations using an improved eye model that incorporates the actual measured ocular length, allowing for more accurate computation of imaging errors and optimized ablation profiles for laser-surgical refraction corrections and intraocular lens design, including corrections for higher-order aberrations like coma, trefoil, and spherical aberrations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If model assumptions for ocular length are used in wavefront aberration measurement, then the measurement process is simplified and can be performed with standard equipment, but the accuracy of the measurement deteriorates when actual ocular length differs from model assumptions

Engineering Contradiction:
Improveease of measurementVSAvoidaccuracy of wavefront aberration measurement
Core Design Contradiction:
Ease of manufactureVSMeasurement precision

Solution Approach 1:

The patent changes the parameter of ocular length from a fixed model assumption to a variable that is individually measured for each patient. By incorporating actual biometric measurements of ocular length into the wavefront aberration calculation, the system adapts to individual anatomical variations, thereby improving measurement accuracy without significantly complicating the measurement process

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements a feedback mechanism where the measured wavefront aberrations are used to iteratively optimize the ocular length parameter. The system adjusts the assumed ocular length based on the measured aberration pattern, creating a closed-loop process that continuously improves measurement accuracy by comparing actual measurements with model predictions

Inventive Principle:
Principle #23Feedback

2Productivity

If standard eye models with fixed ocular length are used, then the computational process is simplified and treatment planning is faster, but the precision of vision correction deteriorates for eyes with non-standard ocular length

Engineering Contradiction:
Improvespeed of treatment planningVSAvoidprecision of vision correction
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent performs preliminary biometric measurement of ocular length before wavefront aberration measurement. By obtaining the actual ocular length measurement in advance and incorporating it into the eye model before treatment planning begins, the system eliminates the need for iterative adjustments during treatment planning, thereby maintaining computational efficiency while improving precision

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent transforms the static, fixed ocular length parameter in standard eye models into a dynamic, patient-specific value. The system allows the ocular length parameter to be individually determined through biometric measurement and then used throughout the treatment planning process, enabling precise customization without significantly increasing computational complexity

Inventive Principle:
Principle #15Dynamics

3Measurement precision

If actual ocular length measurements are incorporated into the eye model, then the accuracy of wavefront aberration measurement is improved, but the complexity of the measurement and computational process increases

Engineering Contradiction:
Improveaccuracy of wavefront aberration measurementVSAvoidcomplexity of measurement process
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent uses a multi-functional approach where the same optical system performs both biometric measurement (ocular length) and wavefront aberration measurement. By integrating these functions into a single measurement process, the system improves accuracy without proportionally increasing device complexity, as the additional functionality is achieved through software processing rather than additional hardware

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the accuracy of wavefront aberration measurements and treatment outcomes by using the actual ocular length, improving the precision of vision correction and intraocular lens design, thereby addressing the limitations of model-based assumptions.

Implementation Method 1

a plurality of component beams are generated from parallel light. The generated component beams exhibit a predetermined two-dimensional arrangement in a plane arranged perpendicular to an optical axis. This arrangement of the component beams is projected through the optical system of the eye

Methodology Applied
Scientific EffectOptical projection and refraction: Refraction

Data Source

PatentEP2872030B1Process and apparatus for determining optical aberrations of an eye
Publication Date: 2016.12.07 WAVELIGHT AG
  • EP2872030B1 patent drawingFigure 1
  • EP2872030B1 patent drawingFigure 2
  • EP2872030B1 patent drawingFigure 3

AI summary

A process and an apparatus are proposed for determining optical aberrations of an eye (12) with its optical system (30) including the cornea (32, 173) and the lens (34, 180). The process includes the reconstructing of wavefront aberrations (100) of the eye (12) as a deviation of the wavefront (102), determined by the optical system (30) of the eye (12) with a process of aberrometry, with respect to an ideal planar wavefront (104) generated by an aberration-free eye model. A measured ocular length is employed for the aberration-free eye model.