Facet Mirror Illumination Switching Segmented Carrier
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Solution Overview
Problem
Facet mirrors for illumination optical units in projection lithography lack the ability to reliably and stably switch between different illumination geometries or settings, leading to thermal instability and inefficiencies.
Innovation Solution
A facet mirror design featuring a plurality of change subunits on a common facet carrier, allowing for the stable and operational reliable positioning of facets with different imaging and direction-influencing properties, where change subunits can be individually displaced to alternate facets without affecting other facets, enabling a high number of predefinable illumination settings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple change subunits are accommodated on a common facet carrier, then the number of predefinable illumination settings is increased, but the device complexity increases
Solution Approach 1:
The facet mirror is divided into multiple change subunits, each carrying a specific change facet. This segmentation allows independent positioning and control of each facet while sharing a common facet carrier structure, thereby increasing the number of illumination settings without proportionally increasing overall device complexity
Solution Approach 2:
The common facet carrier serves as a universal platform that accommodates multiple change subunits with different change facets. This multi-functional design enables a single carrier structure to support multiple illumination geometries and settings, improving adaptability while controlling complexity through shared components
2Area of stationary object
If change subunits are positioned close to each other for compact arrangement, then the facet packing density is improved, but the positioning stability and operational reliability deteriorate
Solution Approach 1:
The facet carrier is designed with locally optimized regions that provide enhanced positioning stability for each change subunit. Each local region around a change subunit has specific structural characteristics that ensure stable positioning, while the overall compact arrangement maximizes space utilization without compromising individual positioning reliability
3Adaptability or versatility
If multiple change facets are arranged along a facet line, then the number of illumination settings is increased, but the manufacturing precision requirements increase
Solution Approach 1:
The facet line is segmented into discrete change subunits, each with its own change facet positioned at specific locations. This segmentation allows standardized manufacturing of individual subunits that can be assembled along the facet line, reducing the overall manufacturing precision requirements compared to creating a single continuous structure with multiple facets
Solution Approach 2:
The change facets are pre-positioned at predetermined locations on the facet carrier during manufacturing. This preliminary positioning ensures that the required geometric relationships and illumination settings are achieved without requiring high precision adjustments during final assembly or operation, thereby reducing manufacturing precision requirements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design ensures stable and reliable switching between various illumination settings, maintaining thermal stability and allowing for a practically uninterrupted packing of facets, thereby enhancing the operational efficiency of the facet mirror in projection lithography.
Implementation Method 1
The change subunits can be embodied in a linearly displaceable fashion. A displacement of a change subunit ensures that exactly one of the used facets is changed for a change facet of the change subunit
Implementation Method 2
The facet mirror has a plurality of used facets which in each case reflect an illumination light partial beam
Data Source
AI summary
A facet mirror for an illumination optical unit for projection lithography has a plurality of used facets, which in each case reflect an illumination light partial beam. The facet mirror has at least one change subunit having a plurality of change facets arranged jointly on a facet carrier, which change facets can be positioned alternatively at the used location of exactly one used facet. This results in a facet mirror with which different illumination geometries or illumination settings can be set operationally reliably and stably.