Faraday Cage Mesh Resistance for Etching Uniformity
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Solution Overview
Problem
Existing methods for manufacturing diffraction lattice light guide plates face challenges in achieving uniform etching and precision due to irregular etch speeds across the faraday cage, leading to distortion and accuracy issues in forming fine structures necessary for uniform light intensity output.
Innovation Solution
A method involving a faraday cage with a mesh portion having a sheet resistance of 0.5 Ω/sq or more is used, allowing for uniform etching by adjusting the etch rate through plasma etching, enabling the simultaneous formation of inclined pattern portions with depth gradients on a substrate, and subsequently manufacturing a diffraction lattice light guide plate with improved accuracy and uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional plasma etching is used with a standard faraday cage, then the etching process can be completed, but the etch speed becomes irregular across different regions leading to poor manufacturing precision
Solution Approach 1:
The faraday cage is divided into multiple regions with different sheet resistance values. The mesh portions have different resistances (first mesh portion: 0.1-1.0 Ω/sq, second mesh portion: 1.0-10.0 Ω/sq, third mesh portion: 10.0-100.0 Ω/sq) to create localized etching characteristics that compensate for position-dependent etch speed variations, achieving uniform etching depth across the entire substrate surface.
2Manufacturing precision
If the mesh portion sheet resistance is increased to 0.5 Ω/sq or more, then etching uniformity is improved, but the faraday cage design becomes more complex
Solution Approach 1:
The faraday cage is segmented into multiple mesh portions with different sheet resistance values. Each mesh portion is designed with specific resistance ranges to control etching at different locations. This segmentation allows precise control of etching uniformity while maintaining a systematic and manufacturable cage structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the precise formation of inclined patterns with depth gradients on a substrate, enhancing the accuracy and uniformity of the diffraction lattice light guide plate, ensuring consistent light intensity and improved display quality.
Implementation Method 1
checking a high etching region within the faraday cage throughout providing a sample substrate on a bottom surface of the faraday cage and carrying out flat plasma etching
Data Source
AI summary
The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.