Conductive Mask Structure for FCVA Electrostatic Chuck Protrusions
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Solution Overview
Problem
Existing protrusions on electrostatic chucks produced by physical vapor deposition (PVD) have poor high-temperature resistance and are prone to falling off, making them unsuitable for high-temperature environments in semiconductor manufacturing.
Innovation Solution
A mask structure comprising conductive metal main and side mask plates is used in a filtered cathodic vacuum arc (FCVA) apparatus to produce protrusions on the electrostatic chuck, guiding carbon plasma ions to form a patterned film layer while shielding the side surface from coating, ensuring the protrusions have high hardness and wear resistance for high-temperature use.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If PVD apparatus is used to prepare protrusions on electrostatic chuck, then protrusions can be formed to reduce particle adhesion, but the protrusions have poor high-temperature resistance and fall off easily
Solution Approach 1:
The patent changes the deposition method from PVD to FCVA (Filtered Cathodic Vacuum Arc), which fundamentally alters the physical and chemical parameters of the deposition process. FCVA produces protrusions with different material properties including higher hardness, better adhesion, and improved high-temperature resistance compared to PVD protrusions
Solution Approach 2:
The patent uses composite material structure by combining conductive metal mask plates with the electrostatic chuck substrate. The mask plates are made of specific conductive materials that can withstand high temperatures while providing the necessary electrical conductivity for the electrostatic chuck operation
2Strength
If mask structure is used in FCVA process, then protrusions with high hardness and wear resistance can be produced, but the device complexity increases
Solution Approach 1:
The mask structure is divided into multiple independent components: main mask plate, side mask plate, and support structure. This segmentation allows each component to be optimized independently and simplifies the overall assembly and replacement process
Solution Approach 2:
The mask structure serves multiple functions simultaneously: it defines the protrusion pattern, provides electrical grounding, shields side surfaces from coating, and supports the deposition process. This multi-functionality reduces the need for additional separate components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The FCVA process using the conductive mask structure produces protrusions with controlled resistivity and high conductivity, meeting requirements and preventing side surface coating, thus enhancing the electrostatic chuck's durability and performance in high-temperature conditions.
Implementation Method 1
a power source, a chamber, and a graphite target, an electrostatic chuck, and a mask structure arranged in the chamber. The power source is configured to cause the graphite target to generate carbon plasma by an effect of an arc.
Implementation Method 2
The deposited ions that pass through form a patterned film layer corresponding to the protrusions on the carrying surface of the electrostatic chuck.
Data Source
AI summary
Embodiments of the present disclosure provide a mask structure and a filtered cathodic vacuum arc (FCVA) apparatus. The mask structure is configured to prepare protrusions on a carrying surface of an electrostatic chuck and includes a main mask plate and a side mask plate that are made of a conductive metal. The main mask plate is configured to form a patterned film layer corresponding to the protrusions on the carrying surface of the electrostatic chuck. The side mask is configured to cover a side surface of the electrostatic chuck to avoid forming a film layer on the side surface. The mask structure can be electrically conductive. The mask structure may prevent the side surface of the electrostatic chuck from being coated when the protrusions are prepared on the carrying surface of the electrostatic chuck. Thus, the mask structure may be applied to an FCVA process.