Overlapping Feature Stack With Dummy Supports for Memory Arrays

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Solution Overview

Problem

In integrated circuit fabrication, the formation of smaller and denser memory cells is hindered by the lack of support for stair-like end portions in arrays, leading to potential sagging or breaking of floors/ceilings between void spaces during processing.

Innovation Solution

The implementation of a stack of horizontally extending and vertically overlapping features, where dummy structures are formed in the end portion to support the features from vertical movement, preventing sagging or breaking by laterally engaging side portions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If memory cells are made smaller to increase density, then productivity and circuit density improve, but structural stability deteriorates due to lack of support in stair-like end portions

Engineering Contradiction:
Improvememory cell densityVSAvoidstructural stability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

Dummy structures are formed in advance in the end portion of the stack to provide support before actual processing occurs. This preliminary structural reinforcement prevents sagging or breaking of floors/ceilings during subsequent fabrication steps, enabling the production of smaller, denser memory cells without compromising structural integrity.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If dummy structures are added to support end portions, then structural stability improves, but device complexity increases

Engineering Contradiction:
Improvestructural stabilityVSAvoidstack structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The stack is divided into two functional regions: a primary portion containing operative structures and an end portion containing dummy structures. This segmentation allows the dummy structures to be localized only where structural support is needed, rather than complicating the entire device structure. The dummy structures serve as a separate support system that does not interfere with the functional operative structures.

Inventive Principle:
Principle #1Segmentation

3Length of moving object

If features are made smaller to reduce component size, then component size decreases, but manufacturing precision requirements increase due to potential sagging or breaking

Engineering Contradiction:
Improvefeature sizeVSAvoidfeature dimensional control
Core Design Contradiction:
Length of moving objectVSManufacturing precision

Solution Approach 1:

Dummy structures are positioned in advance in the end portion to act as a cushioning support system. This preliminary support structure prevents floors/ceilings from sagging or breaking during processing, thereby maintaining dimensional control and manufacturing precision even when features are scaled down to smaller sizes.

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

Data Source

PatentUS11923289B2Stack of horizontally extending and vertically overlapping features, methods of forming circuitry components, and methods of forming an array of memory cells
Publication Date: 2024.03.05 MICRON TECHNOLOGY INC
  • US11923289B2 patent drawing
  • US11923289B2 patent drawing
  • US11923289B2 patent drawing

AI summary

A method of forming circuitry components includes forming a stack of horizontally extending and vertically overlapping features. The features extend horizontally though a primary portion of the stack with at least some of the features extending farther in the horizontal direction in an end portion. Operative structures are formed vertically through the features in the primary portion and dummy structures are formed vertically through the features in the end portion. Openings are formed through the features to form horizontally elongated and vertically overlapping lines from material of the features. The lines individually extend laterally about sides of vertically extending portions of both the operative structures and the dummy structures. Sacrificial material that is elevationally between the lines is at least partially removed in the primary and end portions laterally between the openings. Other aspects and implementations are disclosed.