Free-Electron Laser Synchrotron Radiation Capture for Metrology
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Solution Overview
Problem
Current semiconductor manufacturing lacks an efficient means for producing and harnessing extreme ultraviolet (EUV) power for high-resolution inspection and metrology, particularly in photolithography processes, due to the inefficiencies in existing free-electron laser (FEL) designs and the substantial real estate and costs associated with housing these large sources.
Innovation Solution
The system captures synchrotron radiation energy generated at bending regions of an FEL light source's electron path and utilizes it for operating metrology tools, integrating FEL light sources with semiconductor fabs to provide EUV light for both processing and metrology operations, thereby optimizing energy use and reducing the footprint and costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If free-electron laser sources are used to generate EUV light for photolithography, then sufficient power for HVM can be achieved, but the real estate required and costs to house these large sources become substantial
Solution Approach 1:
The patent combines the lithography tool and metrology tool into a single integrated system, allowing both functions to share the same physical space and infrastructure. This merging eliminates the need for separate large-scale FEL source facilities for both lithography and metrology, significantly reducing the overall facility footprint while maintaining sufficient EUV power for both operations
Solution Approach 2:
The patent creates a multi-functional system where a single FEL source serves dual purposes: driving both the lithography tool for semiconductor manufacturing and the metrology tool for inspection and analysis. This universal approach allows one facility to support multiple critical functions, reducing the total real estate required compared to having separate dedicated facilities for each function
2Loss of energy
If intrinsic energy from FEL lasers is not harnessed, then the system is simpler to design, but energy efficiency and cost-effectiveness are reduced
Solution Approach 1:
The patent converts the previously wasted intrinsic energy from the FEL laser into a useful resource by directing it to power the metrology tool. What was once considered excess or harmful energy loss is now transformed into a beneficial resource that enables high-resolution inspection capabilities, improving overall energy efficiency without proportionally increasing system complexity
Solution Approach 2:
The system is designed to be self-sufficient by using the FEL source's own intrinsic energy to power both the lithography and metrology functions. The metrology tool harnesses energy that would otherwise be wasted, creating a self-service arrangement where the system's own energy output serves multiple functions, reducing the need for additional external energy sources
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient energy utilization from FEL sources for metrology data acquisition and analysis, enhancing the capability for high-resolution inspection and reducing the physical and financial burdens of housing large FEL sources within semiconductor manufacturing facilities.
Implementation Method 1
A first synchrotron radiation is provided from the first electron path bend to a first metrology tool
Data Source
AI summary
At least one method, apparatus and system for providing capturing synchrotron radiation for a metrology tool, are disclosed. A beam using a first light emitting device is provided. The first light emitting device comprises a first electron path bend. A first synchrotron radiation is provided from the first electron path bend to a first metrology tool configured to perform a metrology inspection using the first synchrotron radiation.