Ferrite Core Auxiliary Lens for E-Beam Focus Tuning

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Solution Overview

Problem

Conventional methods for determining focus parameters in electron beam inspection are limited by low accuracy and require multiple scans, which are time-consuming and can contaminate the wafer surface, especially as feature sizes shrink in semiconductor devices.

Innovation Solution

A fast response auxiliary lens with a ferrite core is introduced below the aperture and above the in-lens detector, allowing for precise focus adjustment along the z-direction within ±3 to 5 μm, enabling accurate focusing within one 3D scan and integrating small-area focusing parameters for a larger field of view.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional laser auxiliary focus is used, then the focusing system is simple, but the detecting accuracy is limited within 0.5 μm to 0.01 μm due to wafer surface pattern diffraction

Engineering Contradiction:
Improvefocusing accuracyVSAvoidfocusing system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

An auxiliary lens with ferrite core is introduced as an intermediary component between the objective lens and the specimen. This auxiliary lens mediates the focusing process by providing additional magnetic field control, enabling sub-diffraction accuracy without replacing the entire focusing system.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes the magnetic properties of the auxiliary lens by using ferrite core material, which allows dynamic adjustment of the magnetic field strength and distribution. This parameter change enables precise control of electron beam focusing beyond the limitations of conventional optical methods.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If multiple e-beam images are taken for focusing, then the focusing accuracy can be improved, but the process takes a long time and may contaminate the processing wafer

Engineering Contradiction:
Improvefocusing accuracyVSAvoidfocusing time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The auxiliary lens with ferrite core performs preliminary focusing adjustment before the main imaging process. By pre-adjusting the focus to within ±3 to 5 μm range, the system eliminates the need for multiple iterative scans, achieving accurate focusing in a single scan.

Inventive Principle:
Principle #10Preliminary action

3Measurement precision

If multiple e-beam images are taken for focusing, then the focusing accuracy can be improved, but the wafer surface may be contaminated

Engineering Contradiction:
Improvefocusing accuracyVSAvoidwafer contamination
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The auxiliary lens acts as an intermediary that enables accurate focusing measurement without direct multiple e-beam exposures to the wafer surface. The ferrite core auxiliary lens provides the necessary magnetic field modulation to achieve sub-diffraction accuracy while minimizing wafer exposure.

Inventive Principle:
Principle #24Intermediary (Mediator)

4Speed

If conventional focusing methods are used, then the system is stable, but the focus response speed is slow

Engineering Contradiction:
Improvefocus response speedVSAvoidsystem stability
Core Design Contradiction:
SpeedVSStability of the object's composition

Solution Approach 1:

The auxiliary lens with ferrite core introduces dynamic control capability to the focusing system. The ferrite material allows rapid adjustment of magnetic field parameters, enabling fast focus response while maintaining system stability through controlled magnetic field variations.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables rapid and accurate focus tuning, reducing contamination risks and improving focus accuracy across the entire field of view, facilitating high-speed focusing without affecting the primary beam position.

Implementation Method 1

A fast response auxiliary lens with a ferrite core is introduced below the aperture and above the in-lens detector, allowing for precise focus adjustment along the z-direction within ±3 to 5 μm

Methodology Applied
Scientific EffectMagnetic field: Magnetic Field

Implementation Method 2

A fast response auxiliary lens with a ferrite core is introduced below the aperture and above the in-lens detector

Methodology Applied
Scientific EffectFerromagnetism: Ferromagnetism

Data Source

PatentUS7705298B2System and method to determine focus parameters during an electron beam inspection
Publication Date: 2010.04.27 ASML NETHERLANDS BV
  • US7705298B2 patent drawing
  • US7705298B2 patent drawing
  • US7705298B2 patent drawing

AI summary

This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.