Ferroelectric Memory Device With Dopant Gradient

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current ferroelectric memory devices face challenges in stabilizing ferroelectric properties and maintaining polarization states due to lattice strain and defects, which affect their nonvolatile data storage capabilities.

Innovation Solution

A ferroelectric memory device is developed with a ferroelectric structure that includes a ferroelectric material layer having a concentration gradient of a dopant, generating a lattice strain gradient and an internal electric field, which improves polarization alignment and stabilizes ferroelectric properties by aligning defective dipoles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional ferroelectric material layer is used without dopant gradient, then the manufacturing process is simple, but the ferroelectric properties are unstable and polarization states cannot be maintained

Engineering Contradiction:
Improveferroelectric property stabilityVSAvoiddopant concentration gradient structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies local quality by creating a dopant concentration gradient within the ferroelectric material layer, where the dopant concentration varies spatially from one side to the other. This gradient structure provides different local properties: higher dopant concentration regions stabilize the ferroelectric phase while lower concentration regions maintain switching capability, thereby resolving the contradiction between stability and functionality.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the physical parameter of dopant concentration across the ferroelectric material layer to create a gradient distribution. This parameter change induces a lattice strain gradient that generates internal electric fields, which in turn stabilizes the ferroelectric polarization states and prevents transitions to paraelectric or antiferroelectric phases, directly addressing the reliability issue.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If a uniform dopant distribution is used in the ferroelectric material layer, then the manufacturing process is simple, but defective dipoles cannot be aligned and polarization orientation is poor

Engineering Contradiction:
Improvepolarization alignmentVSAvoidconcentration gradient formation
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

By implementing a dopant concentration gradient, the patent creates local variations in electric field strength and lattice strain throughout the ferroelectric material layer. These local conditions work together to align defective dipoles in the desired polarization direction, improving overall polarization alignment without requiring complex external field applications during manufacturing.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The dopant concentration gradient structure enables the ferroelectric material layer to self-align defective dipoles through internally generated electric fields and lattice strain gradients. This self-service mechanism eliminates the need for complex external alignment processes, thereby improving polarization orientation while keeping the manufacturing process relatively simple.

Inventive Principle:
Principle #25Self-service

3Reliability

If no lattice strain gradient is present, then the manufacturing process is straightforward, but transitions to paraelectric or antiferroelectric states occur, reducing data storage reliability

Engineering Contradiction:
Improvedata storage retentionVSAvoidlattice strain gradient structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the lattice strain parameter by introducing a dopant concentration gradient, which creates corresponding lattice strain gradients throughout the ferroelectric material layer. These strain gradients generate internal electric fields that stabilize the ferroelectric phase and prevent transitions to paraelectric or antiferroelectric states, thereby improving data storage retention.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent effectively creates a composite structure within the ferroelectric material layer by combining regions of different dopant concentrations. This composite approach, with its inherent lattice strain gradient, provides enhanced stability against phase transitions while maintaining the overall ferroelectric functionality needed for data storage applications.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The internal electric field enhances polarization orientation and stabilizes ferroelectric properties, preventing transitions to paraelectric or antiferroelectric states, thereby improving data storage reliability and retention in ferroelectric memory devices.

Implementation Method 1

A ferroelectric structure is disclosed including a ferroelectric material layer having a concentration gradient of a dopant. The dopant may generate a lattice strain in the ferroelectric material layer. The lattice strain gradient may generate a flexoelectric effect, forming an internal electric field in the ferroelectric material layer.

Methodology Applied
Scientific EffectLattice strain gradient:

Implementation Method 2

The lattice strain gradient may generate a flexoelectric effect, forming an internal electric field in the ferroelectric material layer

Methodology Applied
Scientific EffectFlexoelectric effect:

Implementation Method 3

The internal electric field formed in the ferroelectric material layer can improve the polarization orientation in the ferroelectric material layer, thereby stabilizing the ferroelectric properties of the ferroelectric structure

Methodology Applied
Scientific EffectPolarization alignment: Polarisation

Data Source

PatentUS10923501B2Ferroelectric memory device and method of manufacturing the same
Publication Date: 2021.02.16 SK HYNIX INC
  • US10923501B2 patent drawing
  • US10923501B2 patent drawing
  • US10923501B2 patent drawing

AI summary

In an embodiment, a ferroelectric memory element includes a first electrode layer, a ferroelectric structure disposed on the first electrode layer, and a second electrode layer disposed on the ferroelectric structure. The ferroelectric structure includes a ferroelectric material layer having a concentration gradient of a dopant.