Ferroelectric Thin-Film Gate Stack for Uniform Crystal Grain Control

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Solution Overview

Problem

As electronic devices are downscaled, the dispersion of ferroelectric crystal grains increases, leading to non-uniform characteristics and performance variability.

Innovation Solution

A ferroelectric thin film structure is designed with a first ferroelectric layer having smaller crystal grains, limited by a crystallization barrier layer, and optionally additional dielectric and ferroelectric layers, ensuring uniform grain distribution and enhanced performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If the size of electronic devices is reduced, then device miniaturization is achieved, but the dispersion of ferroelectric crystal grains increases leading to non-uniform characteristics

Engineering Contradiction:
Improvedevice sizeVSAvoidcrystal grain uniformity
Core Design Contradiction:
Volume of moving objectVSManufacturing precision

Solution Approach 1:

The ferroelectric layer is segmented into multiple sub-layers (first ferroelectric layer, second ferroelectric layer, third ferroelectric layer) with different crystal grain size ranges. This segmentation allows each sub-layer to contribute differently to the overall polarization, achieving uniform characteristics even in miniaturized devices where a single homogeneous layer would exhibit grain dispersion

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the ferroelectric layer (different sub-layers) are given different local qualities in terms of crystal grain size. The first ferroelectric layer has smaller crystal grains (5-20 nm), the second has medium grains (20-50 nm), and the third has larger grains (50-100 nm). This local differentiation ensures that no single grain size dominates, achieving uniform polarization distribution in small-sized devices

Inventive Principle:
Principle #3Local quality

2Device complexity

If a single ferroelectric layer is used, then device structure is simple, but crystal grain distribution is non-uniform leading to performance variability

Engineering Contradiction:
Improveferroelectric layer structureVSAvoidperformance uniformity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The ferroelectric layer is divided into multiple sub-layers with progressively different crystal grain size ranges. This segmentation transforms a single homogeneous layer into a composite structure where each sub-layer contributes a specific grain size distribution, ensuring uniform overall characteristics and reducing performance variability

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent creates a composite ferroelectric structure by stacking multiple sub-layers with different crystal grain sizes. This composite approach combines the advantages of different grain sizes (small grains for uniformity, larger grains for stability) within a single ferroelectric layer, achieving both reliability and controlled complexity

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The structure achieves small-sized, high-performance electronic devices with uniform electric dipole domain distribution, enabling multi-bit memory capabilities and reduced performance dispersion.

Implementation Method 1

a crystallization barrier layer including a dielectric material... An average of sizes of crystal grains of the first ferroelectric layer is less than or equal to an average of sizes of crystal grains of the second ferroelectric layer

Methodology Applied
Scientific EffectCrystallization barrier:

Implementation Method 2

Ferroelectrics are materials having ferroelectricity and thus spontaneous polarization is maintained therein as electric dipole moments are aligned without an external electric field applied thereto

Methodology Applied
Scientific EffectFerroelectricity:

Data Source

PatentUS12527038B2Electronic device including ferroelectric thin film structure
Publication Date: 2026.01.13 SAMSUNG ELECTRONICS CO LTD
  • US12527038B2 patent drawing
  • US12527038B2 patent drawing
  • US12527038B2 patent drawing

AI summary

An electronic device includes: a substrate including a source, a drain, and a channel between the source and the drain; a gate electrode arranged above the substrate and facing the channel, the gate electrode being apart from the channel in a first direction; and a ferroelectric thin film structure between the channel and the gate electrode, the ferroelectric thin film structure including a first ferroelectric layer, a crystallization barrier layer including a dielectric material, and a second ferroelectric layer, which are sequentially arranged from the channel in the first direction. The average of sizes of crystal grains of the first ferroelectric layer may be less than or equal to the average of sizes of crystal grains of the second ferroelectric layer, and owing to small crystal grains, dispersion of performance may be improved.