Ferroelectric p-n Homojunction Capacitor for Stable Negative Capacitance
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Solution Overview
Problem
Existing capacitive devices using ferroelectric-dielectric heterostructures face instability in negative capacitance effects at room temperature and lower frequencies, resulting in limited capacitance enhancement compared to dielectric layers.
Innovation Solution
The design of capacitive devices featuring bi-layer ferroelectric p-n homojunctions with equal doping concentrations, where n-type and p-type ferroelectric layers form a homojunction without non-ferroelectric dielectric materials, stabilizing the negative capacitance effect and increasing equivalent capacitance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If ferroelectric-dielectric heterostructures are used to achieve negative capacitance effect, then capacitance enhancement is obtained, but instability occurs at room temperature and lower frequencies
Solution Approach 1:
The patent changes the fundamental parameter of the structure from heterointerface (ferroelectric-dielectric) to homointerface (ferroelectric-ferroelectric with different doping). This parameter change enables the negative capacitance effect to stabilize at room temperature and lower frequencies, resolving the temperature and frequency stability issue while maintaining capacitance enhancement
Solution Approach 2:
The patent uses composite ferroelectric materials with different doping types (n-type and p-type) to form the homojunction. This composite approach combines the benefits of both doped layers to achieve stable negative capacitance at room temperature, overcoming the limitations of conventional ferroelectric-dielectric heterostructures
2Reliability
If ferroelectric-dielectric heterostructures are used, then negative capacitance effect is achieved, but capacitance enhancement is limited compared to dielectric layers
Solution Approach 1:
By changing from heterointerface to homointerface configuration, the patent achieves superior capacitance enhancement (exceeding 100% compared to dielectric layers) while maintaining system stability. The homojunction structure enables both high enhancement ratio and large capacitance magnitude simultaneously
3Stability of the object's composition
If conventional ferroelectric-dielectric heterostructures are used, then negative capacitance is achieved, but the effect is transitory and unstable
Solution Approach 1:
The patent transforms the negative capacitance effect from transitory to steady-state by changing the interface configuration from heterointerface to homointerface. This parameter change extends the duration and stability of the effect, enabling continuous operation at room temperature and lower frequencies
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach achieves a stable, steady-state negative capacitance effect at room temperature and lower frequencies, significantly enhancing capacitance by up to 100% compared to component layers, while maintaining stability across varying voltages and frequencies.
Implementation Method 1
A recently implemented method to increase the capacitance of capacitive devices is the use of the negative capacitance (NC) effect shown by ferroelectric materials
Implementation Method 2
Ferroelectric (FE) materials are dielectrics having the ability to spontaneously polarize, whitout the presence of an electric field
Data Source
Figure 1.a~2a
Figure 2b
AI summary
The present invention refers to a capacitive device comprising two electrodes (2, 4) separated by a dielectric medium (5), wherein said dielectric medium (5) consists of one or more pairs of ferroelectric (FE) layers (30,32), each pair having a first, n-type FE layer (30) made of an n-doped FE material and a second, p-type FE layer made of a p-doped FE material, wherein said first and second FE layers (30 and 32) form a FE p-n homojunction and have substantially equal doping concentrations. Furthermore, the present invention refers to a method for manufacturing such a capacitive device. Also, the invention refers to the use of a ferroelectric bi-layer forming a p-n homojunction wherein the two layers have substantially equal p-type and n-type doping concentrations in a capacitive device.