FET Sensor Array Surface Treatment for Analyte Capture
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Solution Overview
Problem
Semiconductor sensor arrays used in analytical chemistry and molecular biology often have surface alterations and residues from processing that hinder analyte capture, leading to reduced effectiveness and erroneous data due to altered surface chemistry.
Innovation Solution
A method involving the application of a treatment solution containing an organo-silicon compound, an organic acid, and an organic solvent, followed by rinsing and potential basic solution application, to restore the surface chemistry of sensor arrays, improving analyte capture and signal quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If semiconductor processing techniques are used to manufacture sensor arrays, then the sensor arrays can be produced with precise structures and functions, but the surface chemistry is altered and residues are left that prevent analyte capture
Solution Approach 1:
The patent applies chemical treatment solutions that modify the surface chemistry parameters of the sensor array. By changing the chemical state of the surface through controlled treatment processes, the harmful effects of manufacturing-induced surface alterations are reversed, restoring analyte capture capability while preserving the precise structural integrity achieved during manufacturing.
Solution Approach 2:
The patent converts the harmful surface residues and altered chemistry into beneficial conditions for analyte capture. Through specific chemical treatments, the previously harmful surface modifications are transformed into favorable surface properties that enhance analyte binding, turning the manufacturing byproducts into functional advantages.
2Reliability
If surface treatment is applied to restore analyte capture, then analyte loading and signal quality improve, but additional processing steps are required
Solution Approach 1:
The patent combines multiple treatment functions into a single integrated treatment solution that simultaneously addresses surface chemistry restoration, residue removal, and analyte capture enhancement. This consolidation reduces the number of separate processing steps while maintaining comprehensive surface restoration, thereby improving reliability without proportionally increasing device complexity.
3Measurement precision
If multiple treatment solutions are applied to maximize analyte loading, then signal-to-noise ratio improves, but treatment time and process complexity increase
Solution Approach 1:
The patent employs continuous treatment protocols where multiple treatment solutions are applied in sequence without interruption, maintaining constant useful action on the sensor surface. This continuous processing approach maximizes analyte loading efficiency and signal-to-noise ratio while minimizing idle time between steps, thereby improving measurement precision without excessive time loss.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The treatment method enhances the loading of analytes onto sensor arrays, improves signal strength, and increases the signal-to-noise ratio, particularly in FET-based sensors, thereby improving sequencing performance and data accuracy.
Implementation Method 1
applying a treatment solution to the sensor array... The treatment solution can include an organic solvent, an organic acid, and an organo-silicon compound
Implementation Method 2
The treatment solution can include an organic solvent, an organic acid, and an organo-silicon compound... followed by rinsing and potential basic solution application
Implementation Method 3
The treatment solution can include an organic solvent, an organic acid, and an organo-silicon compound
Data Source
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AI summary
A method of treating a sensor array, including a plurality of sensors, preferably CHEMFETs, and an isolation structure, where a sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array and the isolation structure is disposed between the sensor pad and sensor pads of other sensors of the plurality of sensors, comprises exposing the sensor pad and the isolation structure to a non-aqueous organo-silicon solution including an organo-silicon compound, preferably polydimethylsiloxane (PDMS), and a first non-aqueous carrier; applying an acid solution including an organic acid, preferably dodecyl benzene sulfonic acid (DBSA), and a second non-aqueous carrier to the sensor pad; and rinsing the acid solution from the sensor pad and the isolation structure.