FFS LCD Array Substrate Single-Step Gate Common Electrode Formation
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Solution Overview
Problem
The conventional method of manufacturing fringe field switching (FFS) mode liquid crystal display (LCD) panels is complex and costly, requiring six photolithographic processes for the array substrate.
Innovation Solution
A method is developed to form the gate electrodes, gate lines, and common electrode in a single photolithographic process, with subsequent steps forming data lines, source/drain electrodes, and pixel electrodes, while reducing the thickness of insulating materials between the pixel and common electrodes by using a passivation layer with openings to expose the pixel electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If six photolithographic processes are used to form the array substrate of FFS mode LCD panel, then the manufacturing precision and quality are improved, but the device complexity and manufacturing cost increase
Solution Approach 1:
The patent merges the formation of gate electrodes, gate lines, and common electrode into a single photolithographic process. Specifically, a first photoresist layer is patterned to define all three structures simultaneously, and a single etching process removes the conducting layer to form all three components in one step, thereby reducing the total number of photolithographic processes from six to one while maintaining manufacturing precision
Solution Approach 2:
The first photoresist layer serves multiple functions: it defines the pattern for gate electrodes, gate lines, and common electrode, and acts as an etching mask for all three structures. This multi-functional use of a single photoresist layer and etching process eliminates the need for separate photolithographic processes for each component, reducing process complexity while ensuring consistent manufacturing quality
2Manufacturing precision
If six photolithographic processes are used to form the array substrate of FFS mode LCD panel, then the manufacturing quality is improved, but the manufacturing cost increases
Solution Approach 1:
The patent combines multiple photolithographic processes into one by using a single patterned photoresist layer to define gate electrodes, gate lines, and common electrode simultaneously. This merging reduces the number of expensive photolithography steps from six to one, significantly lowering manufacturing cost while maintaining the required quality through precise single-step patterning
3Reliability
If the thickness of insulating materials between pixel electrode and common electrode is reduced, then the performance of driving liquid crystal molecules is improved, but the manufacturing complexity increases
Solution Approach 1:
The gate insulating layer is formed to cover the gate electrode and common electrode before the pixel electrode is formed. This preliminary formation of the insulating layer establishes the correct thickness and positioning of insulating materials between the pixel electrode and common electrode from the outset, enabling improved liquid crystal driving performance without requiring complex subsequent manufacturing steps to adjust or reduce the thickness
Data Source
AI summary
An array substrate of a fringe field switching (FFS) mode liquid crystal display (LCD) panel and manufacturing method thereof are provided. The gate electrodes and the common electrode of the FFS mode LCD panel are formed on the array substrate by the same photolithographic process, and the common electrode, the gate lines and the gate electrodes are disposed on the same layer. The passivation layer of the FFS mode LCD panel is formed on the pixel electrodes. The passivation layer has a plurality of first openings, and each of the first openings at least partially exposes the pixel electrodes.