Fringe Field Switching LCD Five-Mask Manufacturing Process
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Solution Overview
Problem
Conventional fringe field switching mode liquid crystal display devices require six mask processes for manufacturing, which is inefficient and leads to potential membrane contamination and image quality issues due to distorted horizontal electric fields.
Innovation Solution
A method that reduces mask processes by forming a gate electrode, active pattern, source/drain electrodes, pixel electrode, and common electrode using five masks, with specific photolithography and etching processes to minimize contamination and ensure high image quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If six mask processes are used for manufacturing fringe field switching mode liquid crystal display device, then the device structure can be formed, but the manufacturing complexity and time increase
Solution Approach 1:
The patent combines multiple mask processes into fewer steps by using a single mask to form both the pixel electrode and common electrode patterns simultaneously. This merging of operations reduces the total number of mask processes from six to fewer steps, directly addressing the contradiction between forming the required device structure and reducing manufacturing time
2Reliability
If six mask processes are used for manufacturing, then the device structure can be formed, but the manufacturing process complexity increases
Solution Approach 1:
The patent merges the formation of pixel electrode and common electrode into a single mask process step. By designing the mask to create both electrode patterns simultaneously and using a single-layer conductive film that serves dual functions, the manufacturing process complexity is reduced while still forming the required device structure
3Reliability
If multiple mask processes are performed, then the device structure can be formed, but membrane contamination may occur
Solution Approach 1:
The patent reduces the number of mask processes by combining operations, which directly reduces the opportunities for membrane contamination to occur between steps. Fewer mask applications and fewer intermediate handling steps mean fewer chances for contaminants to be introduced to the delicate membrane structures
Solution Approach 2:
The patent forms the conductive layer that will serve as both pixel electrode and common electrode before subsequent processing steps. This preliminary formation of the dual-function conductive structure early in the process reduces the need for later mask operations that would increase contamination risk
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the manufacturing process, prevents membrane contamination, and ensures high image quality by maintaining the integrity of the horizontal electric field, thereby preventing image smear in liquid crystal display devices.
Implementation Method 1
specific photolithography and etching processes
Implementation Method 2
specific photolithography and etching processes
Data Source
AI summary
A liquid crystal display device includes a gate electrode formed on a substrate; a active pattern and an ohmic contact pattern formed to overlap with the gate electrode with a gate insulating film therebetween; a source electrode formed on the active pattern and the ohmic contact; a drain electrode formed to oppose the source electrode; a pixel electrode overlapped with the drain electrode and directly contacted with the drain electrode; a common electrode formed to overlap with the pixel electrode with a passivation film therebetween and having a plurality of holes; and wherein the plurality of holes of the common electrode are only formed on a region in which the pixel electrode is formed.