Focused Ion Beam Interpolation for Shape Reproduction
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Solution Overview
Problem
Focused ion beam apparatuses struggle to efficiently process complex shapes with curved lines or surfaces, as existing methods degrade image data resolution when scaling, leading to incomplete reproduction of original shapes during etching or deposition processes.
Innovation Solution
A focused ion beam apparatus with an interpolating unit that smoothes pixel intensity changes during deformation of the processing area image, allowing for precise control of ion beam dosage based on pixel intensities and enabling binarization for consistent processing, thereby reproducing original images even after deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the processing area image is reduced in scale, then the processing time is reduced, but the resolution deteriorates and the original shape cannot be reproduced
Solution Approach 1:
The patent applies parameter changes by performing interpolation processing on the processing area image before irradiation. This interpolation recalculates pixel intensities at new positions based on the original image data, effectively changing the parameter of image resolution to maintain high quality even when the processing area is reduced in scale. The control unit generates a new processing area image with interpolated pixel values that preserve the original shape characteristics.
2Area of stationary object
If the processing area image is enlarged in scale, then the coverage area is increased, but the image quality deteriorates unless pixel intensities are adequately set
Solution Approach 1:
The patent resolves this contradiction by dynamically changing the pixel intensity parameters through interpolation processing. When the processing area is enlarged, the control unit calculates new pixel intensities based on the original image data, ensuring that the enlarged image maintains adequate quality without requiring manual adjustment of pixel intensities. This automatic parameter adjustment enables both increased coverage and maintained image quality.
3Device complexity
If the number of pixels is reduced through scale reduction, then the data processing load is reduced, but the shape reproduction accuracy deteriorates
Solution Approach 1:
The patent applies parameter changes by performing interpolation processing that recalculates pixel values based on the original high-resolution image data. This ensures that even with fewer pixels in the reduced-scale processing area image, the shape reproduction accuracy is maintained because each pixel's intensity is derived from the original detailed image through mathematical interpolation rather than simple downsampling.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures accurate reproduction of original images during processing, allowing for efficient formation of features with varying diameters or deposits, while reducing processing time and load on the control unit.
Implementation Method 1
a focused ion beam irradiating mechanism configured to irradiate the sample with a focused ion beam
Implementation Method 2
a detector configured to detect a secondary charged particle generated from the sample when being irradiated with the focused ion beam
Data Source
AI summary
A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.