Focused Ion Beam Cross-Section Imaging with Reflected Electron Screening
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Solution Overview
Problem
The detection time for EDS images across multiple cross-sections in focused ion beam apparatuses is excessively long due to the time-consuming nature of elemental analysis using EDS detectors.
Innovation Solution
A focused ion beam apparatus that forms multiple cross-sections and uses reflected electron images to identify regions of specific composition, allowing for the generation of EDS images only where necessary, thereby reducing the overall detection time by utilizing reflected electron images to represent regions of specific composition within the sample.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If EDS detection is performed on all cross-sections to obtain complete elemental analysis images, then measurement precision is improved, but detection time becomes excessively long
Solution Approach 1:
The patent segments the cross-sections into two groups: typical cross-sections that are represented by reflected electron images, and non-typical cross-sections that require EDS detection. This segmentation allows the system to perform rapid reflected electron imaging on all cross-sections while applying time-consuming EDS detection only to the necessary subset, thereby resolving the contradiction between complete elemental analysis and detection time.
Solution Approach 2:
Instead of performing EDS detection on all cross-sections (excessive action), the patent applies EDS detection partially only to non-typical cross-sections identified through reflected electron image analysis. This partial action maintains measurement precision for elemental analysis while significantly reducing the total detection time by avoiding redundant EDS measurements on typical cross-sections.
2Productivity
If reflected electron imaging is used for all cross-sections to reduce detection time, then productivity is improved, but measurement precision for specific composition identification deteriorates
Solution Approach 1:
The patent segments cross-sections into typical and non-typical categories based on reflected electron image analysis. Typical cross-sections are quickly identified and represented by reflected electron images alone, while non-typical cross-sections are flagged for additional EDS detection. This segmentation maintains high productivity while ensuring measurement precision is not compromised for cross-sections requiring detailed elemental analysis.
Solution Approach 2:
Reflected electron images serve as an intermediary screening tool between rapid imaging and detailed EDS analysis. The system first captures reflected electron images for all cross-sections, uses these intermediate results to identify non-typical cases, and then applies EDS detection only where needed. This intermediary approach optimizes both productivity and measurement precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the rapid identification of specific compositions within a sample by using reflected electron images to determine where EDS images are required, significantly reducing the overall detection time for elemental analysis across multiple cross-sections.
Implementation Method 1
a first cross-section and a plurality of second cross-sections at predetermined intervals from the first cross-section and substantially parallel to the first cross-section, the second cross-sections being formed by subjecting the sample to removal processing
Implementation Method 2
a first detector configured to detect reflected particles or secondary electrons emitted due to irradiation of the charged particle beam on the first cross-section and the second cross-section
Implementation Method 3
a second detector configured to detect X-rays or secondary ions emitted due to irradiation of the charged particle beam on the first cross-section and the second cross-section
Data Source
AI summary
A focused ion beam apparatus includes a focused ion beam irradiation mechanism that forms first and second cross-sections in a sample. A first image generation unit generates respective first images, either reflected electron images or secondary electron images, of the first and second cross-sections, and a second image generation unit generates a second image that is an EDS image of the first cross-section. A control section generates a three-dimensional image of a specific composition present in the sample based on the first images and the second image.