FIB-SEM Microscope Periodic EDS Mapping for 3D Imaging
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Solution Overview
Problem
The existing methods for acquiring energy dispersive X-ray spectrometry (EDS) mapping data in scanning electron microscopes require a long measurement time due to lower spatial resolution compared to SEM images, necessitating prolonged data acquisition for constructing three-dimensional images.
Innovation Solution
A scanning electron microscope configuration with an ion beam column and an electron beam column, controlled by a unit that alternates between higher spatial resolution SEM image acquisition and lower spatial resolution EDS mapping image acquisition, where SEM images are taken each time a cross-section is exposed and EDS images are taken after multiple exposures, reducing overall measurement time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If EDS mapping measurement is performed to acquire compositional information, then measurement precision is improved, but measurement time increases
Solution Approach 1:
The system performs EDS mapping measurements periodically at predetermined intervals during the sequential cross-section exposure process, rather than continuously or at every step. This periodic measurement approach allows compositional information to be acquired at representative intervals, maintaining measurement precision while significantly reducing total measurement time compared to continuous measurement.
Solution Approach 2:
The system performs SEM image acquisition at every cross-section exposure step as a preliminary action before performing EDS mapping measurements. This allows the system to capture high-resolution structural information frequently while limiting time-consuming compositional analysis to predetermined intervals, optimizing the balance between information quality and measurement time.
2Measurement precision
If multiple EDS mapping images are acquired to construct three-dimensional image, then measurement precision is improved, but productivity decreases
Solution Approach 1:
The system acquires EDS mapping images at predetermined intervals during the sequential exposure process, performing compositional analysis periodically rather than at every step. This approach maintains sufficient data quality for three-dimensional reconstruction while dramatically improving productivity by reducing the number of time-consuming measurements required.
Solution Approach 2:
The measurement process is segmented into two distinct phases: frequent SEM image acquisition at every cross-section for high-resolution structural information, and periodic EDS mapping acquisition at predetermined intervals for compositional information. This segmentation allows each measurement type to be optimized independently, maintaining three-dimensional image quality while improving overall data acquisition rate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the total measurement time by optimizing the acquisition process, allowing for efficient generation of both high-resolution SEM and EDS mapping images, thereby facilitating the construction of three-dimensional images in a shorter period.
Implementation Method 1
an ion beam column that irradiates a specimen with an ion beam; processing to control the ion beam column to cause cross-sections of the specimen to be exposed at predetermined intervals
Implementation Method 2
an electron beam column that irradiates the specimen with an electron beam; a first detector that detects a first signal from the specimen; a second detector that detects a second signal from the specimen
Data Source
AI summary
A scanning electron microscope includes an FIB column, an SEM column, and a control unit which controls the FIB column and the SEM column. The control unit performs: processing to control the FIB column so that a cross-section of a specimen S is repeatedly exposed at predetermined intervals; processing to perform a first measurement to acquire a first image by irradiating a cross-section of the specimen S with an electron beam each time when a cross-section of the specimen S is exposed; and processing to perform a second measurement to acquire a second image by irradiating a cross-section of the specimen S with an electron beam each time when a cross-section of the specimen S is exposed n times (n is an integer of 2 or more).