Field-Emitting Electrode Microplasma Generator for Low-Power Cooling

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Solution Overview

Problem

Existing semiconductor devices require mechanical devices for fluid movement, which are power-intensive and unsuitable for low-power, small-form-factor applications, necessitating a low-power mechanism for fluid direction and plasma generation.

Innovation Solution

The use of an anode-cathode geometry with low work function materials on field-emitting electrodes to generate microplasmas at low voltage, allowing for the manipulation of both ionized and non-ionized gas molecules through electric fields, thereby reducing power consumption and eliminating the need for mechanical devices.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Use of energy by moving object

If mechanical devices (fans) are used to move fluid, then fluid movement is achieved, but power consumption increases and device size increases

Engineering Contradiction:
Improvepower consumptionVSAvoidfluid movement capability
Core Design Contradiction:
Use of energy by moving objectVSEase of operation

Solution Approach 1:

The patent replaces mechanical fluid movement devices (fans) with a plasma-based system. Field-emitting electrodes generate a plasma that creates ionized fluid particles, which are then manipulated by electric fields to move both ionized and non-ionized particles through the fluid, achieving fluid direction without mechanical components.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the physical state of the fluid by creating a plasma (ionized state) from ambient gas. This phase change allows the fluid to be manipulated through electric fields, enabling low-power control compared to mechanical systems. The plasma is generated at low voltage using field emission from electrodes with specific geometries and low work function materials.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If traditional plasma generation methods are used, then plasma is generated, but power consumption is high

Engineering Contradiction:
Improveplasma generationVSAvoidpower consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent replaces traditional high-power plasma generation methods with field emission-based plasma generation. Field-emitting electrodes use quantum tunneling effects to emit electrons at low voltages, creating plasma without the high power consumption of conventional methods. The low work function materials on the electrodes enable efficient electron emission at reduced voltages.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Power

If field-emitting electrodes with low work function materials are used, then plasma generation voltage is reduced, but device complexity increases

Engineering Contradiction:
Improveplasma generation voltageVSAvoidelectrode structure
Core Design Contradiction:
PowerVSDevice complexity

Solution Approach 1:

The patent applies low work function materials specifically to the field-emitting electrode surfaces where plasma generation occurs. This localized application of special materials reduces plasma generation voltage at the critical interface without requiring the entire device to be complex. The anode-cathode geometry is optimized locally at the electrode-gas interface to enhance field emission efficiency.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables efficient microplasma generation and manipulation at lower voltages than traditional methods, suitable for microchip-level applications like on-chip cooling and materials analysis, while reducing power consumption and device size.

Implementation Method 1

The geometry and cathode materials cause the cathode to emit electrons through field emission

Methodology Applied
Scientific EffectField emission: Electron Beam

Implementation Method 2

this disclosure relates generally to semiconductor devices, and more specifically, to a mechanism for generating a low-voltage microplasma using a field-emitting electrode

Methodology Applied
Scientific EffectElectric field manipulation: Electric Field

Implementation Method 3

by forming a plasma and then manipulating that plasma with an electric field

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 4

The geometry and cathode materials cause the cathode to emit electrons through field emission

Methodology Applied
Scientific EffectWork function:

Data Source

PatentUS10236163B1Microplasma generator with field emitting electrode
Publication Date: 2019.03.19 NXP USA INC
  • US10236163B1 patent drawing
  • US10236163B1 patent drawing
  • US10236163B1 patent drawing

AI summary

Techniques for providing generation of a microplasma around a semiconductor device die or package through the use of an anode-cathode geometry that allows for microplasmas to be created at low voltage. The geometry and cathode materials cause the cathode to emit electrons through field emission. These field emission electrons result in significantly more electrons available for the generation of the microplasma than would be present due to the ambient fluid alone. Thus, the ignition and maintenance of the microplasma occurs at a lower voltage than typical for a fluid at that pressure and the distances involved.