Field Manipulator for Lithographic Beam Position and Focus Control
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Solution Overview
Problem
Lithographic systems face challenges in achieving high resolution control for focus and position, particularly in the XY plane, especially with the limited space available in projection systems, and the need for a single manipulator to provide both XY position control and focus control to meet rigorous performance demands as critical dimensions decrease.
Innovation Solution
A field manipulator comprising a pair of substantially parallel plates and an actuator that adjusts the radiation beam's position in a plane orthogonal to the optical axis and/or focuses the beam, allowing for both XY position control and focus control through tilting, deformation, and varying spacing between the plates, with options for gas or liquid filling and temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple manipulators are used to provide both XY position control and focus control, then the control performance is improved, but the device complexity and space requirements increase
Solution Approach 1:
The patent applies a single manipulator that performs multiple functions: it provides both XY position control and focus control capabilities. This manipulator includes a first actuator for XY positioning and a second actuator for focus adjustment, allowing one device to replace what would traditionally require multiple separate manipulators, thereby reducing complexity while maintaining high overlay performance
Solution Approach 2:
The patent combines XY position control and focus control into a single manipulator assembly. The manipulator integrates a support structure with both actuators working together to control the radiation beam, merging functions that would traditionally be separated into different manipulators to reduce the overall number of components and space requirements
2Manufacturing precision
If the projection system space is increased to accommodate multiple manipulators, then the control capability is improved, but the device size increases
Solution Approach 1:
By designing a single manipulator that performs both XY positioning and focus control, the patent eliminates the need for additional manipulators that would require extra space in the projection system. This multi-functional design achieves high precision control without increasing the overall device footprint
3Manufacturing precision
If conventional manipulators are used without advanced control, then the device simplicity is maintained, but the resolution control for critical dimensions becomes insufficient
Solution Approach 1:
The patent incorporates feedback control mechanisms where sensors detect the actual position and focus of the radiation beam, and this information is fed back to the control system. The controllers then adjust the actuators accordingly to maintain precise XY positioning and focus, enabling high resolution control for critical dimensions through closed-loop feedback rather than open-loop control
Data Source
AI summary
A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.