Photosensitive Film Depressurization and Hydration Before Development
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Solution Overview
Problem
Existing substrate processing methods face challenges in maintaining consistent pattern formation due to variations in residual substances within the photosensitive film, which are influenced by differences in transfer times and residual substances remaining after exposure processes.
Innovation Solution
The method involves forming a photosensitive film on a substrate, exposing it in a first chamber, transferring it to a second chamber for pressure reduction to subatmospheric pressure, followed by hydration with a moisture-containing gas, and then developing the film, thereby reducing residual substances and stabilizing the film state.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate is transferred quickly between chambers, then productivity is improved, but pattern formation consistency deteriorates due to variations in residual substances
Solution Approach 1:
The pressure reduction process is performed as a preliminary action before development to remove residual substances from the photosensitive film. By conducting pressure reduction immediately after exposure and before development, the system prepares the film in advance to minimize variations in residual substances, ensuring consistent pattern formation while maintaining efficient throughput.
Solution Approach 2:
The system changes the pressure parameter from atmospheric to subatmospheric during the pressure reduction process. This parameter change creates a pressure differential that facilitates the removal of residual substances from the photosensitive film, thereby improving pattern formation consistency without requiring extended transfer times that would reduce productivity.
2Manufacturing precision
If pressure reduction is performed to remove residual substances, then pattern formation consistency is improved, but processing time increases
Solution Approach 1:
The pressure reduction process is integrated into the continuous processing flow between exposure and development chambers. By maintaining continuous substrate transfer and performing pressure reduction as an inline process rather than a separate batch operation, the system achieves effective residual substance removal without significant time loss, preserving high productivity while improving pattern consistency.
3Manufacturing precision
If the substrate remains in the exposure chamber longer, then residual substances are reduced, but productivity decreases
Solution Approach 1:
The pressure reduction chamber serves as an intermediary environment between the exposure and development chambers. Instead of extending the time in the exposure chamber, the system uses the pressure reduction chamber as a mediator to facilitate residual substance removal through pressure differential, thereby achieving the same effect without increasing the time in the exposure chamber and maintaining productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces pattern variations between and within substrates by minimizing the influence of residual substances, enhancing processing efficiency and throughput.
Implementation Method 1
performing a pressure reduction process to reduce pressure inside the second chamber to a subatmospheric pressure
Implementation Method 2
subjecting the photosensitive film to a moisture-containing gas
Data Source
AI summary
A substrate processing method includes: forming a photosensitive film on a surface of a substrate; accommodating the substrate with the formed photosensitive film in a first chamber and exposing the photosensitive film to exposure light in the first chamber; accommodating the substrate with the formed photosensitive film in a second chamber different from the first chamber and performing a pressure reduction process to reduce pressure inside the second chamber to a subatmospheric pressure; subjecting, after the pressure reduction process, the photosensitive film to a moisture-containing gas; and developing the photosensitive film of the substrate after exposing and subjecting.