Film Layer Defect Filtering Using Historical Layer Comparison
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In the manufacturing of display panels, particularly for OLED and LCDs, the repeated detection of defect information across multiple film layers increases data complexity and storage needs, as each film layer's defects are often recorded independently, without considering historical layers, leading to redundant data and increased analysis complexity.
Innovation Solution
A method and system that acquire and process defect information from current and historical film layers, determining if defects in the current layer are caused by historical layers, allowing for deletion of redundant defect information, thereby retaining only defects caused by current layer factors, reducing data storage and simplifying analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If defect information is recorded for each film layer independently, then complete defect data is obtained, but data complexity and storage needs increase
Solution Approach 1:
The patent extracts and removes redundant defect information from historical film layers that appears in current film layer defects. By comparing defect locations across layers and eliminating duplicates, the system retains only unique defect information while maintaining data completeness for analysis.
Solution Approach 2:
The patent discards redundant defect data that has already been recorded in historical layers, while recovering and preserving unique defect information. This selective retention strategy reduces storage requirements and data complexity without losing essential defect information for quality analysis.
2Loss of information
If defect information from all film layers is stored, then comprehensive defect analysis is enabled, but storage space increases
Solution Approach 1:
The system extracts only the essential unique defect information from multiple film layers, removing redundant duplicate entries. This extraction process maintains the completeness of defect analysis data while significantly reducing the total storage volume required.
Solution Approach 2:
Redundant defect information that has been previously recorded in historical film layers is discarded, while unique defect information is recovered and retained. This approach optimizes storage space while preserving all necessary defect data for comprehensive analysis.
3Reliability
If defect information is recorded without filtering historical layers, then all defects are captured, but analysis complexity increases
Solution Approach 1:
The patent extracts unique defect information by comparing current film layer defects with historical layer defects. This extraction eliminates redundant data points, making defect analysis simpler while maintaining accurate detection of all genuine defects across the product lifecycle.
Data Source
AI summary
The present disclosure provides a method for processing defect information of a product, which includes the following steps of: acquiring defect information on a current film layer and defect information on historical film layers; determining whether defect information exists at a target location of the historical film layer if defect information exists at a target location of the current film layer; if defect information exists for a corresponding location to the target location in at least one of the historical film layers, deleting the defect information detected at the target location in the current film layer; and if no defect information exists for the target location in any of the historical film layers, retaining the defect information detected at the target location in the current film layer. According to this, for the defect information on the current film layer, only the defect information caused by factors of the current film layer may be retained, and the defect information caused by the historical film layers will not be retained, and thus, on the one hand, the stored data volume may be reduced, and on the other hand, the complexity of subsequent analysis of defect information may be simplified.