Film Thickness Adjustment Using Zernike-Based Position Correction

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Solution Overview

Problem

Existing film forming processes require separate stages for adjusting the transfer position of substrates and process conditions, leading to prolonged adjustment operations.

Innovation Solution

An adjustment processing apparatus that calculates and integrates both transfer position and process condition adjustments using orthogonal polynomials, specifically the Zernike polynomial, to optimize film thickness distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If separate stages are used for adjusting transfer position and process condition, then each adjustment can be performed independently, but the total adjustment time is prolonged

Engineering Contradiction:
Improvefilm thickness distributionVSAvoidadjustment operation time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent combines the transfer position adjustment and process condition adjustment into a single integrated adjustment operation. The adjustment processing apparatus simultaneously determines both the transfer position correction amount and process condition correction amount based on film thickness measurement results, eliminating the need for sequential separate adjustments and thereby reducing total adjustment time while maintaining manufacturing precision

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The adjustment processing apparatus performs multiple adjustment functions simultaneously - it既 adjusts the transfer position of the substrate既 adjusts the process conditions of the film forming apparatus. This multi-functional approach allows a single adjustment operation to achieve both centering alignment and film thickness uniformity, resolving the time loss associated with separate adjustment stages

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Loss of time

If integrated adjustment is performed simultaneously, then adjustment time is reduced, but the complexity of the adjustment processing increases

Engineering Contradiction:
Improveadjustment operation timeVSAvoidadjustment processing complexity
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The patent introduces an adjustment processing apparatus as an intermediary system that receives film thickness measurement results and automatically calculates both transfer position correction amounts and process condition correction amounts. This intermediary processing unit simplifies the overall complexity by centralizing the calculation logic and providing automated determination of adjustment parameters, rather than requiring complex coordinated control between multiple separate adjustment systems

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS20250376767A1Adjustment processing apparatus, film forming processing system, adjustment processing method and storage medium
Publication Date: 2025.12.11 TOKYO ELECTRON LTD
  • US20250376767A1 patent drawing
  • US20250376767A1 patent drawing
  • US20250376767A1 patent drawing

AI summary

An adjustment processing apparatus includes: a film thickness measurement result acquisition unit that acquires a film thickness measurement result of a substrate including a film formed thereon by a film forming processing apparatus; a formulation unit that formulates the film thickness measurement result using an orthogonal polynomial; and an adjustment unit that adjusts a transfer position of the substrate and a process condition of the film forming processing apparatus based on a weight of each component of the orthogonal polynomial calculated during formulation.